Gradient solvent vapor annealing of block copolymer thin films using a microfluidic mixing device

Julie N.L. Albert, Timothy D. Bogart, Ronald L. Lewis, Kathryn L. Beers, Michael J. Fasolka, J. Brian Hutchison, Bryan Vogt, Thomas H. Epps

Research output: Contribution to journalArticle

83 Scopus citations

Abstract

Solvent vapor annealing (SVA) with solvent mixtures is a promising approach for controlling block copolymer thin film self-assembly. In this work, we present the design and fabrication of a solvent-resistant microfluidic mixing device to produce discrete SVA gradients in solvent composition and/or total solvent concentration. Using this device, we identified solvent composition dependent morphology transformations in poly(styrene-b-isoprene-b-styrene) films. This device enables faster and more robust exploration of SVA parameter space, providing insight into self-assembly phenomena.

Original languageEnglish (US)
Pages (from-to)1351-1357
Number of pages7
JournalNano letters
Volume11
Issue number3
DOIs
StatePublished - Mar 9 2011

All Science Journal Classification (ASJC) codes

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanical Engineering

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    Albert, J. N. L., Bogart, T. D., Lewis, R. L., Beers, K. L., Fasolka, M. J., Hutchison, J. B., Vogt, B., & Epps, T. H. (2011). Gradient solvent vapor annealing of block copolymer thin films using a microfluidic mixing device. Nano letters, 11(3), 1351-1357. https://doi.org/10.1021/nl104496r