Abstract
Reflection high-energy electron diffraction (RHEED) operated at high pressure has been used to monitor the initial growth of titanium nitride (TiN) thin films on single-crystal (100) MgO substrates by pulsed laser deposition (PLD). This is the first RHEED study where the growth of TiN films is produced by PLD directly from a TiN target. At the initial stage of the growth (average thickness ∼2.4 nm) the formation of islands is observed. During the continuous growth the islands merge into a smooth surface as indicated by the RHEED, atomic force microscopy and field emission scanning electron microscopy. These observations are in good agreement with the three-dimensional Volmer-Weber growth type, by which three-dimensional crystallites are formed and later cause a continuous surface roughening. This leads to an exponential decrease in the intensity of the specular spot in the RHEED pattern as well.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 705-710 |
| Number of pages | 6 |
| Journal | Applied Physics A: Materials Science and Processing |
| Volume | 93 |
| Issue number | 3 |
| DOIs | |
| State | Published - Nov 1 2008 |
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All Science Journal Classification (ASJC) codes
- Chemistry(all)
- Materials Science(all)
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Growth of thin films of TiN on MgO(100) monitored by high-pressure RHEED. / Pryds, N.; Cockburn, Darrell; Rodrigo, K.; Rasmussen, I. L.; Knudsen, J.; Schou, J.
In: Applied Physics A: Materials Science and Processing, Vol. 93, No. 3, 01.11.2008, p. 705-710.Research output: Contribution to journal › Article
TY - JOUR
T1 - Growth of thin films of TiN on MgO(100) monitored by high-pressure RHEED
AU - Pryds, N.
AU - Cockburn, Darrell
AU - Rodrigo, K.
AU - Rasmussen, I. L.
AU - Knudsen, J.
AU - Schou, J.
PY - 2008/11/1
Y1 - 2008/11/1
N2 - Reflection high-energy electron diffraction (RHEED) operated at high pressure has been used to monitor the initial growth of titanium nitride (TiN) thin films on single-crystal (100) MgO substrates by pulsed laser deposition (PLD). This is the first RHEED study where the growth of TiN films is produced by PLD directly from a TiN target. At the initial stage of the growth (average thickness ∼2.4 nm) the formation of islands is observed. During the continuous growth the islands merge into a smooth surface as indicated by the RHEED, atomic force microscopy and field emission scanning electron microscopy. These observations are in good agreement with the three-dimensional Volmer-Weber growth type, by which three-dimensional crystallites are formed and later cause a continuous surface roughening. This leads to an exponential decrease in the intensity of the specular spot in the RHEED pattern as well.
AB - Reflection high-energy electron diffraction (RHEED) operated at high pressure has been used to monitor the initial growth of titanium nitride (TiN) thin films on single-crystal (100) MgO substrates by pulsed laser deposition (PLD). This is the first RHEED study where the growth of TiN films is produced by PLD directly from a TiN target. At the initial stage of the growth (average thickness ∼2.4 nm) the formation of islands is observed. During the continuous growth the islands merge into a smooth surface as indicated by the RHEED, atomic force microscopy and field emission scanning electron microscopy. These observations are in good agreement with the three-dimensional Volmer-Weber growth type, by which three-dimensional crystallites are formed and later cause a continuous surface roughening. This leads to an exponential decrease in the intensity of the specular spot in the RHEED pattern as well.
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U2 - 10.1007/s00339-008-4700-2
DO - 10.1007/s00339-008-4700-2
M3 - Article
VL - 93
SP - 705
EP - 710
JO - Applied Physics A: Materials Science and Processing
JF - Applied Physics A: Materials Science and Processing
SN - 0947-8396
IS - 3
ER -