Growth of thin films of TiN on MgO(100) monitored by high-pressure RHEED

N. Pryds; Darrell Cockburn; K. Rodrigo; I. L. Rasmussen; J. Knudsen; J. Schou

doi:10.1007/s00339-008-4700-2

Growth of thin films of TiN on MgO(100) monitored by high-pressure RHEED

N. Pryds, Darrell Cockburn, K. Rodrigo, I. L. Rasmussen, J. Knudsen, J. Schou

Research output: Contribution to journal › Article › peer-review

11 Scopus citations

Abstract

Reflection high-energy electron diffraction (RHEED) operated at high pressure has been used to monitor the initial growth of titanium nitride (TiN) thin films on single-crystal (100) MgO substrates by pulsed laser deposition (PLD). This is the first RHEED study where the growth of TiN films is produced by PLD directly from a TiN target. At the initial stage of the growth (average thickness ∼2.4 nm) the formation of islands is observed. During the continuous growth the islands merge into a smooth surface as indicated by the RHEED, atomic force microscopy and field emission scanning electron microscopy. These observations are in good agreement with the three-dimensional Volmer-Weber growth type, by which three-dimensional crystallites are formed and later cause a continuous surface roughening. This leads to an exponential decrease in the intensity of the specular spot in the RHEED pattern as well.

Original language	English (US)
Pages (from-to)	705-710
Number of pages	6
Journal	Applied Physics A: Materials Science and Processing
Volume	93
Issue number	3
DOIs	https://doi.org/10.1007/s00339-008-4700-2
State	Published - Nov 1 2008

All Science Journal Classification (ASJC) codes

Chemistry(all)
Materials Science(all)

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title = "Growth of thin films of TiN on MgO(100) monitored by high-pressure RHEED",

abstract = "Reflection high-energy electron diffraction (RHEED) operated at high pressure has been used to monitor the initial growth of titanium nitride (TiN) thin films on single-crystal (100) MgO substrates by pulsed laser deposition (PLD). This is the first RHEED study where the growth of TiN films is produced by PLD directly from a TiN target. At the initial stage of the growth (average thickness ∼2.4 nm) the formation of islands is observed. During the continuous growth the islands merge into a smooth surface as indicated by the RHEED, atomic force microscopy and field emission scanning electron microscopy. These observations are in good agreement with the three-dimensional Volmer-Weber growth type, by which three-dimensional crystallites are formed and later cause a continuous surface roughening. This leads to an exponential decrease in the intensity of the specular spot in the RHEED pattern as well.",

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AU - Pryds, N.

AU - Cockburn, Darrell

AU - Rodrigo, K.

AU - Rasmussen, I. L.

AU - Knudsen, J.

AU - Schou, J.

PY - 2008/11/1

Y1 - 2008/11/1

N2 - Reflection high-energy electron diffraction (RHEED) operated at high pressure has been used to monitor the initial growth of titanium nitride (TiN) thin films on single-crystal (100) MgO substrates by pulsed laser deposition (PLD). This is the first RHEED study where the growth of TiN films is produced by PLD directly from a TiN target. At the initial stage of the growth (average thickness ∼2.4 nm) the formation of islands is observed. During the continuous growth the islands merge into a smooth surface as indicated by the RHEED, atomic force microscopy and field emission scanning electron microscopy. These observations are in good agreement with the three-dimensional Volmer-Weber growth type, by which three-dimensional crystallites are formed and later cause a continuous surface roughening. This leads to an exponential decrease in the intensity of the specular spot in the RHEED pattern as well.

AB - Reflection high-energy electron diffraction (RHEED) operated at high pressure has been used to monitor the initial growth of titanium nitride (TiN) thin films on single-crystal (100) MgO substrates by pulsed laser deposition (PLD). This is the first RHEED study where the growth of TiN films is produced by PLD directly from a TiN target. At the initial stage of the growth (average thickness ∼2.4 nm) the formation of islands is observed. During the continuous growth the islands merge into a smooth surface as indicated by the RHEED, atomic force microscopy and field emission scanning electron microscopy. These observations are in good agreement with the three-dimensional Volmer-Weber growth type, by which three-dimensional crystallites are formed and later cause a continuous surface roughening. This leads to an exponential decrease in the intensity of the specular spot in the RHEED pattern as well.

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