Sequential implantation of argon ions and low-energy hydrogen ions has been found to yield Schottky barriers of exceptionally high values on p-type silicon. The interaction of these ions in Si is quite complex, involving donor defect generation, defect passivation, and acceptor dopant neutralization. The apparent synergism of these specific implants has resulted in Al/p-Si Schottky diodes with an effective barrier height as high as 0.83 eV, among the highest value reported for any metal/p-Si contact.
All Science Journal Classification (ASJC) codes
- Electrical and Electronic Engineering
- Electronic, Optical and Magnetic Materials