Semiconducting two-dimensional transition metal chalcogenide crystals have been regarded as the promising candidate for the future generation of transistor in modern electronics. However, how to fabricate those crystals into practical devices with acceptable performance still remains as a challenge. Employing tungsten disulfide multilayer thin crystals, we demonstrate that using gold as the only contact metal and choosing appropriate thickness of the crystal, high performance transistor with on/off ratio of 108 and mobility up to 234 cm2 V-1 s-1 at room temperature can be realized in a simple device structure. Furthermore, low temperature study revealed that the high performance of our device is caused by the minimized Schottky barrier at the contact and the existence of a shallow impurity level around 80 meV right below the conduction band edge. From the analysis on temperature dependence of field-effect mobility, we conclude that strongly suppressed phonon scattering and relatively low charge impurity density are the key factors leading to the high mobility of our tungsten disulfide devices.
|Original language||English (US)|
|Number of pages||7|
|State||Published - Oct 28 2014|
All Science Journal Classification (ASJC) codes
- Materials Science(all)
- Physics and Astronomy(all)