High-pressure chemical deposition for void-free filling of extreme aspect ratio templates

Justin R. Sparks, Neil F. Baril, Banafsheh Keshavarzi, Mahesh Krishnamurthi, Ivan Temnykh, Pier J.A. Sazio, Anna C. Peacock, Ali Borhan, Venkatraman Gopalan, John V. Badding

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Abstract

Near atomically smooth, void-free, centimeter-long amorphous silicon waveguides are produced by high pressure chemical fluid deposition in the pores of a microstructured optical fiber template (right inset). Semiconductor waveguides fabricated by conventional deposition/fabrication approaches have a surface roughness that is a constraining factor in most optoelectronic devices, but these waveguides conform to the extraordinarily geometrically perfect optical fiber pores (DIC image, bottom inset).

Original languageEnglish (US)
Pages (from-to)4605-4611
Number of pages7
JournalAdvanced Materials
Volume22
Issue number41
DOIs
StatePublished - Nov 2 2010

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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    Sparks, J. R., Baril, N. F., Keshavarzi, B., Krishnamurthi, M., Temnykh, I., Sazio, P. J. A., Peacock, A. C., Borhan, A., Gopalan, V., & Badding, J. V. (2010). High-pressure chemical deposition for void-free filling of extreme aspect ratio templates. Advanced Materials, 22(41), 4605-4611. https://doi.org/10.1002/adma.201001199