Holographic control of motive shape in plasmonic nanogap arrays

Xi Zhang, Martin Theuring, Qiang Song, Weidong Mao, Milan Begliarbekov, Stefan Strauf

Research output: Contribution to journalArticle

31 Citations (Scopus)

Abstract

Here we demonstrate that 4-beam holographic lithography can be utilized to create plasmonic nanogaps that are 70 times smaller than the laser wavelength (488 nm). This was achieved by controlling phase, polarization, and laser beam intensity in order to tune the relative spacing of the two sublattices in the interference pattern of a compound-lattice in combination with the nonlinear resist response. Exemplarily, twin and triplet motive features were designed and patterned into polymer in a single exposure step and then transferred into gold nanogap arrays resulting in an average gap size of 22 nm and smallest features down to 7 nm. These results extend the utility of high-throughput, wafer-scale holographic lithography into the realm of nanoplasmonics.

Original languageEnglish (US)
Pages (from-to)2715-2719
Number of pages5
JournalNano letters
Volume11
Issue number7
DOIs
StatePublished - Jul 13 2011

Fingerprint

Lithography
lithography
Gold
Laser beams
Polymers
Throughput
Polarization
Wavelength
sublattices
Lasers
spacing
wafers
laser beams
gold
interference
polymers
polarization
wavelengths
lasers

All Science Journal Classification (ASJC) codes

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanical Engineering

Cite this

Zhang, X., Theuring, M., Song, Q., Mao, W., Begliarbekov, M., & Strauf, S. (2011). Holographic control of motive shape in plasmonic nanogap arrays. Nano letters, 11(7), 2715-2719. https://doi.org/10.1021/nl200994k
Zhang, Xi ; Theuring, Martin ; Song, Qiang ; Mao, Weidong ; Begliarbekov, Milan ; Strauf, Stefan. / Holographic control of motive shape in plasmonic nanogap arrays. In: Nano letters. 2011 ; Vol. 11, No. 7. pp. 2715-2719.
@article{ba19973c15284aedbdcb6c5801e116f0,
title = "Holographic control of motive shape in plasmonic nanogap arrays",
abstract = "Here we demonstrate that 4-beam holographic lithography can be utilized to create plasmonic nanogaps that are 70 times smaller than the laser wavelength (488 nm). This was achieved by controlling phase, polarization, and laser beam intensity in order to tune the relative spacing of the two sublattices in the interference pattern of a compound-lattice in combination with the nonlinear resist response. Exemplarily, twin and triplet motive features were designed and patterned into polymer in a single exposure step and then transferred into gold nanogap arrays resulting in an average gap size of 22 nm and smallest features down to 7 nm. These results extend the utility of high-throughput, wafer-scale holographic lithography into the realm of nanoplasmonics.",
author = "Xi Zhang and Martin Theuring and Qiang Song and Weidong Mao and Milan Begliarbekov and Stefan Strauf",
year = "2011",
month = "7",
day = "13",
doi = "10.1021/nl200994k",
language = "English (US)",
volume = "11",
pages = "2715--2719",
journal = "Nano Letters",
issn = "1530-6984",
publisher = "American Chemical Society",
number = "7",

}

Zhang, X, Theuring, M, Song, Q, Mao, W, Begliarbekov, M & Strauf, S 2011, 'Holographic control of motive shape in plasmonic nanogap arrays', Nano letters, vol. 11, no. 7, pp. 2715-2719. https://doi.org/10.1021/nl200994k

Holographic control of motive shape in plasmonic nanogap arrays. / Zhang, Xi; Theuring, Martin; Song, Qiang; Mao, Weidong; Begliarbekov, Milan; Strauf, Stefan.

In: Nano letters, Vol. 11, No. 7, 13.07.2011, p. 2715-2719.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Holographic control of motive shape in plasmonic nanogap arrays

AU - Zhang, Xi

AU - Theuring, Martin

AU - Song, Qiang

AU - Mao, Weidong

AU - Begliarbekov, Milan

AU - Strauf, Stefan

PY - 2011/7/13

Y1 - 2011/7/13

N2 - Here we demonstrate that 4-beam holographic lithography can be utilized to create plasmonic nanogaps that are 70 times smaller than the laser wavelength (488 nm). This was achieved by controlling phase, polarization, and laser beam intensity in order to tune the relative spacing of the two sublattices in the interference pattern of a compound-lattice in combination with the nonlinear resist response. Exemplarily, twin and triplet motive features were designed and patterned into polymer in a single exposure step and then transferred into gold nanogap arrays resulting in an average gap size of 22 nm and smallest features down to 7 nm. These results extend the utility of high-throughput, wafer-scale holographic lithography into the realm of nanoplasmonics.

AB - Here we demonstrate that 4-beam holographic lithography can be utilized to create plasmonic nanogaps that are 70 times smaller than the laser wavelength (488 nm). This was achieved by controlling phase, polarization, and laser beam intensity in order to tune the relative spacing of the two sublattices in the interference pattern of a compound-lattice in combination with the nonlinear resist response. Exemplarily, twin and triplet motive features were designed and patterned into polymer in a single exposure step and then transferred into gold nanogap arrays resulting in an average gap size of 22 nm and smallest features down to 7 nm. These results extend the utility of high-throughput, wafer-scale holographic lithography into the realm of nanoplasmonics.

UR - http://www.scopus.com/inward/record.url?scp=79960251145&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=79960251145&partnerID=8YFLogxK

U2 - 10.1021/nl200994k

DO - 10.1021/nl200994k

M3 - Article

C2 - 21671590

AN - SCOPUS:79960251145

VL - 11

SP - 2715

EP - 2719

JO - Nano Letters

JF - Nano Letters

SN - 1530-6984

IS - 7

ER -

Zhang X, Theuring M, Song Q, Mao W, Begliarbekov M, Strauf S. Holographic control of motive shape in plasmonic nanogap arrays. Nano letters. 2011 Jul 13;11(7):2715-2719. https://doi.org/10.1021/nl200994k