HTS Flux-Flow Channels On Silicon Wafers

D. B. Fenner, D. M. Potrepka, P. A. Rosenthal, J. Luo, W. D. Hamblen, J. I. Budnick, Q. Li

Research output: Contribution to journalArticlepeer-review

3 Scopus citations


New process/structure designs for the channel in the vortex flux-flow transistor (VFFT) have been explored utilizing thin YBCO films on silicon wafers. Two designs are reported: first, films on micromachined Sl(100) surfaces, and second, films ex-situ annealed in bromine. Shallow trenches are anisotropically etched into Si(100) wafers forming (111) facets, and films are grown by pulsed laser deposition. Bromination processing of YBCO is preceded by mild deoxidation and followed by a re-oxidation. Broad-area characterizations by R(T), dc magnetometry, and ac susceptibility are given. On Si(100), epitaxial YBCO films have sharp R(T) transitions and high Jc. Films on Si(111) and brominated films have a toe in R(T) at Tco, and lower Jcmore easily reduced by H. YBCO falling across the trenched surfaces or small brominated regions have R(T), I-V, and Ic promising for use as flux-flow channels in VFFT.

Original languageEnglish (US)
Pages (from-to)3397-3400
Number of pages4
JournalIEEE Transactions on Applied Superconductivity
Issue number2
StatePublished - Jun 1995

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering


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