Hybrid approaches to nanolithography: Photolithographic structures with precise, controllable nanometer-scale spacings created by molecular rulers

Mary E. Anderson, Morgan Mihok, Hirofumi Tanaka, Lim Piu Tan, Mark W. Horn, Gregory S. McCarty, Paul S. Weiss

Research output: Contribution to journalArticlepeer-review

43 Scopus citations

Abstract

The molecular-ruler nanolithography process was used to create photolithographic structures with precise controllable nanometer-scale spacings. This process utilized the selective placement and controlled thickness of self-assembled multilayers to form precise molecular-ruler resists. Some of the advantages of the process include the features of high-resolution and precision, selective deposition, compatibility with different forms of lithographic processing, low production cost, and mild processing conditions. The precise molecular-ruler resists were used to define nanometer-scale spacings between initial and subsequently registered photolithographically patterned structures. Parallel hybrid methodologies used two techniques in combination to fabricate structures that interface nanometer- and micrometer-scale components.

Original languageEnglish (US)
Pages (from-to)1020-1022
Number of pages3
JournalAdvanced Materials
Volume18
Issue number8
DOIs
StatePublished - Apr 18 2006

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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