Identification of macroscopic variables for low-order modeling of thin-film growth

Amit Varshney, Antonios Armaou

Research output: Contribution to journalArticle

19 Scopus citations

Abstract

We identify a minimum set of "coarse" (i.e., macroscopic) spatially invariant parameters that accurately describe the dominant behavior of the deposition surface during thin-film growth under adsorption and surface diffusion. We demonstrate, through kinetic Monte Carlo (kMC) simulations, that different deposition surfaces constructed through a stochastic reconstruction procedure, with identical values for these parameters, exhibit approximately identical coarse dynamic behavior. These parameters can be subsequently employed to develop low-order state-space models for controller synthesis and optimization as an alternative to computationally expensive kMC simulations.

Original languageEnglish (US)
Pages (from-to)8290-8298
Number of pages9
JournalIndustrial and Engineering Chemistry Research
Volume45
Issue number25
DOIs
StatePublished - Dec 6 2006

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Chemical Engineering(all)
  • Industrial and Manufacturing Engineering

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