Impact of Post-Lithography Polymer Residue on the Electrical Characteristics of MoS 2 and WSe 2 Field Effect Transistors

Jierui Liang, Ke Xu, Blaec Toncini, Brian Bersch, Bhakti Jariwala, Yu Chuan Lin, Joshua Robinson, Susan K. Fullerton-Shirey

Research output: Contribution to journalArticlepeer-review

19 Scopus citations

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Engineering & Materials Science