@article{aef3feb3ee3b40e0af2cf486f6018b2d,
title = "Imprinting of Local Metallic States into VO2 with Ultraviolet Light",
abstract = "Materials exhibiting electronic phase transitions have attracted widespread attention. By switching between metallic and insulating states under external stimuli, the accompanying changes in the electrical and optical properties can be harnessed in novel electronic and optical applications. In this work, a laterally confined conductive pattern is inscribed into an otherwise insulating VO2 thin film using ultraviolet light, inducing an almost four orders of magnitude decrease in electrical resistivity of the exposed area. The metallic imprint remains in VO2 after ultraviolet light exposure and can be completely erased by a short low temperature anneal. The ability to optically pattern confined metallic structures provides new opportunities for reconfigurable photonic and plasmonic structures, as well as re-writable electric circuitry.",
author = "Zhang, {Hai Tian} and Lu Guo and Greg Stone and Lei Zhang and Zheng, {Yuan Xia} and Eugene Freeman and Keefer, {Derek W.} and Subhasis Chaudhuri and Hanjong Paik and Moyer, {Jarrett A.} and Michael Barth and Schlom, {Darrell G.} and Badding, {John V.} and Suman Datta and Venkatraman Gopalan and Roman Engel-Herbert",
note = "Funding Information: H.-T.Z. and L.G. contributed equally to this work. H.-T.Z., V.G., and R.E.-H. were supported by the DOE DE-SC0012375. L.G. was supported by the Office of Naval Research through Grant No. N00014-11-1-0665 and G.S. was supported by Penn State MRSEC program DMR-1420620. H.P. and D.G.S. acknowledge support from the Center for Low Energy Systems Technology (LEAST), one of six centers of STARnet, a Semiconductor Research Corporation program sponsored by MARCO and DARPA. E.F., M.B., and S.D. acknowledge financial support by the Office of Naval Research through award N00014-11-1-0665. J.V.B. and S.C. were supported by DARPA PULSE (1550650, MOD5). D.W.K. acknowledge financial support from DARPA (XSOLIDS) under ARO contract number W31P4Q13I0005. The authors thank V. Bojan and the Materials Characterization Lab (MCL) at Penn State for the help in XPS measurements. Publisher Copyright: {\textcopyright} 2016 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim",
year = "2016",
month = sep,
day = "26",
doi = "10.1002/adfm.201601890",
language = "English (US)",
volume = "26",
pages = "6612--6618",
journal = "Advanced Functional Materials",
issn = "1616-301X",
publisher = "Wiley-VCH Verlag",
number = "36",
}