In-situ plume diagnosis during pulsed laser deposition of epitaxial-oxide thin films

David B. Fenner, Pang Jen Kung, Jorn Gores, Qi Li

Research output: Contribution to journalConference article

1 Citation (Scopus)

Abstract

The visible plume, induced during pulsed-laser deposition (PLD) of epitaxial La0.5Sr0.5CoO3/Ba0.4Sr0.6TiO3/ La0.5Sr0.5CoO3/YBa2Cu3O7/YSZ heterostructures on silicon (100) wafers, was studied by optical-emission spectroscopy (OES). These films are suitable for the fabrication of ferroelectric capacitors and pyroelectric-sensor devices. A YAG laser, at 266 nm, is used for ablation. A collection lens transfers the PLD-plume emission into an optical fiber and onto a diffraction grating and a CCD array, for time-averaged spectroscopy from 410 to 640 nm. Plume emissions from ablated targets in the presence of an oxygen ambient, due to various atomic (Ba, Co, Cu, Sr, Ti, Y, Zr), ionic (Ba+, La+, Sr+, Y+), and a diatomic oxide (YO) species were identified. Emission intensity and evolution of ablated species are reported for distance away from the target surface, oxygen pressures, and laser fluences (1 to 4 J/cm2). The behavior of reactive-product species, especially YO for plumes from yttria-stabilized zirconia (YSZ) and YBCO targets, is discussed. This simple and inexpensive OES system is suitable for use as a plume-quality monitor on routine PLD film synthesis.

Original languageEnglish (US)
Pages (from-to)163-168
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Volume397
StatePublished - Jan 1 1996
EventProceedings of the 1995 MRS Fall Meeting - Boston, MA, USA
Duration: Nov 26 1995Dec 1 1995

Fingerprint

Pulsed laser deposition
Oxide films
pulsed laser deposition
plumes
Optical emission spectroscopy
Yttria stabilized zirconia
Thin films
oxides
thin films
Oxygen
optical emission spectroscopy
yttria-stabilized zirconia
Lasers
Diffraction gratings
Ablation
Silicon wafers
Charge coupled devices
Oxides
Ferroelectric materials
Heterojunctions

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

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title = "In-situ plume diagnosis during pulsed laser deposition of epitaxial-oxide thin films",
abstract = "The visible plume, induced during pulsed-laser deposition (PLD) of epitaxial La0.5Sr0.5CoO3/Ba0.4Sr0.6TiO3/ La0.5Sr0.5CoO3/YBa2Cu3O7/YSZ heterostructures on silicon (100) wafers, was studied by optical-emission spectroscopy (OES). These films are suitable for the fabrication of ferroelectric capacitors and pyroelectric-sensor devices. A YAG laser, at 266 nm, is used for ablation. A collection lens transfers the PLD-plume emission into an optical fiber and onto a diffraction grating and a CCD array, for time-averaged spectroscopy from 410 to 640 nm. Plume emissions from ablated targets in the presence of an oxygen ambient, due to various atomic (Ba, Co, Cu, Sr, Ti, Y, Zr), ionic (Ba+, La+, Sr+, Y+), and a diatomic oxide (YO) species were identified. Emission intensity and evolution of ablated species are reported for distance away from the target surface, oxygen pressures, and laser fluences (1 to 4 J/cm2). The behavior of reactive-product species, especially YO for plumes from yttria-stabilized zirconia (YSZ) and YBCO targets, is discussed. This simple and inexpensive OES system is suitable for use as a plume-quality monitor on routine PLD film synthesis.",
author = "Fenner, {David B.} and Kung, {Pang Jen} and Jorn Gores and Qi Li",
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In-situ plume diagnosis during pulsed laser deposition of epitaxial-oxide thin films. / Fenner, David B.; Kung, Pang Jen; Gores, Jorn; Li, Qi.

In: Materials Research Society Symposium - Proceedings, Vol. 397, 01.01.1996, p. 163-168.

Research output: Contribution to journalConference article

TY - JOUR

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AU - Fenner, David B.

AU - Kung, Pang Jen

AU - Gores, Jorn

AU - Li, Qi

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AB - The visible plume, induced during pulsed-laser deposition (PLD) of epitaxial La0.5Sr0.5CoO3/Ba0.4Sr0.6TiO3/ La0.5Sr0.5CoO3/YBa2Cu3O7/YSZ heterostructures on silicon (100) wafers, was studied by optical-emission spectroscopy (OES). These films are suitable for the fabrication of ferroelectric capacitors and pyroelectric-sensor devices. A YAG laser, at 266 nm, is used for ablation. A collection lens transfers the PLD-plume emission into an optical fiber and onto a diffraction grating and a CCD array, for time-averaged spectroscopy from 410 to 640 nm. Plume emissions from ablated targets in the presence of an oxygen ambient, due to various atomic (Ba, Co, Cu, Sr, Ti, Y, Zr), ionic (Ba+, La+, Sr+, Y+), and a diatomic oxide (YO) species were identified. Emission intensity and evolution of ablated species are reported for distance away from the target surface, oxygen pressures, and laser fluences (1 to 4 J/cm2). The behavior of reactive-product species, especially YO for plumes from yttria-stabilized zirconia (YSZ) and YBCO targets, is discussed. This simple and inexpensive OES system is suitable for use as a plume-quality monitor on routine PLD film synthesis.

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