Inactivation of Escherichia coli O157: H7 on inoculated alfalfa seeds with pulsed ultraviolet light and response surface modeling

R. R. Sharma, Ali Demirci

Research output: Contribution to journalArticle

112 Citations (Scopus)

Abstract

Escherichia coli O157:H7-inoculated alfalfa seeds with seed layer thicknesses of 1.02 to 6.25 mm were subjected to pulsed UV light for up to 90 s at a 8-cm distance from the UV strobe. Population reductions higher than 4 log10 colony-forming units (CFU)/g were achieved. For effect of distance from the UV strobe, seeds with 6.25-mm layer thickness were treated 3 to 13 cm from the strobe. Reductions at shorter distances, such as 60 s at 5 cm (1.93 log10 CFU/g) and 60 to 90 s at 8 cm (4.89 log10 CFU/g), were significantly higher (P ≤ 0.05). Data from the treatments were used to develop empirical models as a function of distance or layer thickness and treatment time for predicting the population of E. coli O157:H7 during pulsed UV-light treatment. This study demonstrates that pulsed UV light holds promise for eliminating pathogens from alfalfa seeds, and the models developed can be useful predictive tools.

Original languageEnglish (US)
Pages (from-to)1448-1453
Number of pages6
JournalJournal of Food Science
Volume68
Issue number4
DOIs
StatePublished - Jan 1 2003

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Escherichia coli O157
Medicago sativa
Ultraviolet Rays
ultraviolet radiation
alfalfa
Seeds
inactivation
Stem Cells
seeds
Population
pathogens

All Science Journal Classification (ASJC) codes

  • Food Science

Cite this

@article{42373f3a4e6c41ad8c45255f9a90f601,
title = "Inactivation of Escherichia coli O157: H7 on inoculated alfalfa seeds with pulsed ultraviolet light and response surface modeling",
abstract = "Escherichia coli O157:H7-inoculated alfalfa seeds with seed layer thicknesses of 1.02 to 6.25 mm were subjected to pulsed UV light for up to 90 s at a 8-cm distance from the UV strobe. Population reductions higher than 4 log10 colony-forming units (CFU)/g were achieved. For effect of distance from the UV strobe, seeds with 6.25-mm layer thickness were treated 3 to 13 cm from the strobe. Reductions at shorter distances, such as 60 s at 5 cm (1.93 log10 CFU/g) and 60 to 90 s at 8 cm (4.89 log10 CFU/g), were significantly higher (P ≤ 0.05). Data from the treatments were used to develop empirical models as a function of distance or layer thickness and treatment time for predicting the population of E. coli O157:H7 during pulsed UV-light treatment. This study demonstrates that pulsed UV light holds promise for eliminating pathogens from alfalfa seeds, and the models developed can be useful predictive tools.",
author = "Sharma, {R. R.} and Ali Demirci",
year = "2003",
month = "1",
day = "1",
doi = "10.1111/j.1365-2621.2003.tb09665.x",
language = "English (US)",
volume = "68",
pages = "1448--1453",
journal = "Journal of Food Science",
issn = "0022-1147",
publisher = "Wiley-Blackwell",
number = "4",

}

Inactivation of Escherichia coli O157 : H7 on inoculated alfalfa seeds with pulsed ultraviolet light and response surface modeling. / Sharma, R. R.; Demirci, Ali.

In: Journal of Food Science, Vol. 68, No. 4, 01.01.2003, p. 1448-1453.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Inactivation of Escherichia coli O157

T2 - H7 on inoculated alfalfa seeds with pulsed ultraviolet light and response surface modeling

AU - Sharma, R. R.

AU - Demirci, Ali

PY - 2003/1/1

Y1 - 2003/1/1

N2 - Escherichia coli O157:H7-inoculated alfalfa seeds with seed layer thicknesses of 1.02 to 6.25 mm were subjected to pulsed UV light for up to 90 s at a 8-cm distance from the UV strobe. Population reductions higher than 4 log10 colony-forming units (CFU)/g were achieved. For effect of distance from the UV strobe, seeds with 6.25-mm layer thickness were treated 3 to 13 cm from the strobe. Reductions at shorter distances, such as 60 s at 5 cm (1.93 log10 CFU/g) and 60 to 90 s at 8 cm (4.89 log10 CFU/g), were significantly higher (P ≤ 0.05). Data from the treatments were used to develop empirical models as a function of distance or layer thickness and treatment time for predicting the population of E. coli O157:H7 during pulsed UV-light treatment. This study demonstrates that pulsed UV light holds promise for eliminating pathogens from alfalfa seeds, and the models developed can be useful predictive tools.

AB - Escherichia coli O157:H7-inoculated alfalfa seeds with seed layer thicknesses of 1.02 to 6.25 mm were subjected to pulsed UV light for up to 90 s at a 8-cm distance from the UV strobe. Population reductions higher than 4 log10 colony-forming units (CFU)/g were achieved. For effect of distance from the UV strobe, seeds with 6.25-mm layer thickness were treated 3 to 13 cm from the strobe. Reductions at shorter distances, such as 60 s at 5 cm (1.93 log10 CFU/g) and 60 to 90 s at 8 cm (4.89 log10 CFU/g), were significantly higher (P ≤ 0.05). Data from the treatments were used to develop empirical models as a function of distance or layer thickness and treatment time for predicting the population of E. coli O157:H7 during pulsed UV-light treatment. This study demonstrates that pulsed UV light holds promise for eliminating pathogens from alfalfa seeds, and the models developed can be useful predictive tools.

UR - http://www.scopus.com/inward/record.url?scp=0038189658&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0038189658&partnerID=8YFLogxK

U2 - 10.1111/j.1365-2621.2003.tb09665.x

DO - 10.1111/j.1365-2621.2003.tb09665.x

M3 - Article

AN - SCOPUS:0038189658

VL - 68

SP - 1448

EP - 1453

JO - Journal of Food Science

JF - Journal of Food Science

SN - 0022-1147

IS - 4

ER -