Influence of a water rinse on the structure and properties of poly(3,4-ethylene dioxythiophene):Poly(styrene sulfonate) films

Dean M. DeLongchamp, Bryan Vogt, Charles M. Brooks, Kenji Kano, Jan Obrzut, Curt A. Richter, Oleg A. Kirillov, Eric K. Lin

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Abstract

Poly(3,4-ethylene dioxythiophene):poly(styrene sulfonic acid) (PEDOT:PSS) films exhibit a complex structure of interconnected conductive PEDOT domains in an insulating PSS matrix that controls their electrical properties. This structure is modified by a water rinse, which removes PSS with negligible PEDOT loss. Upon PSS removal, film thickness is reduced by 35%, conductivity is increased by 50%, and a prominent dielectric relaxation is eliminated. These results suggest that the removed PSS is not associated with PEDOT and that the conductive domain network is not substantially altered by the removal of a significant fraction of insulator. The removal of PSS may benefit organic light emitting diode fabrication by reducing acid attack on indium tin oxide electrodes and lead to more robust performance in switching circuits by extending the working frequency range.

Original languageEnglish (US)
Pages (from-to)11480-11483
Number of pages4
JournalLangmuir
Volume21
Issue number24
DOIs
Publication statusPublished - Nov 22 2005

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All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Spectroscopy
  • Electrochemistry

Cite this

DeLongchamp, D. M., Vogt, B., Brooks, C. M., Kano, K., Obrzut, J., Richter, C. A., ... Lin, E. K. (2005). Influence of a water rinse on the structure and properties of poly(3,4-ethylene dioxythiophene):Poly(styrene sulfonate) films. Langmuir, 21(24), 11480-11483. https://doi.org/10.1021/la051403l