Influence of base additives on the reaction-diffusion front of model chemically amplified photoresists

Bryan D. Vogt, Shuhui Kang, Vivek M. Prabhu, Ashwin Rao, Eric K. Lin, Wen Li Wu, Sushil K. Satija, Karen Turnquest

Research output: Contribution to journalArticlepeer-review

32 Scopus citations

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