Influence of hydrogen plasma treatment on boron implanted junctions in silicon

Sanjay Rangan, Mark Horn, S. Ashok, Y. N. Mohapatra

Research output: Contribution to journalArticlepeer-review

1 Scopus citations
Original languageEnglish (US)
Pages (from-to)781-784
Number of pages4
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume21
Issue number2
DOIs
StatePublished - 2003

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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