Interfacial structure of photoresist thin films in developer solutions

Vivek M. Prabhu, Bryan D. Vogt, Wen Li Wu, Jack F. Douglas, Eric K. Lin, Sushil K. Satija, Dario L. Goldfarb, Hiroshi Ito

Research output: Contribution to journalConference article

1 Citation (Scopus)

Abstract

A depth profile of the base developer counterion concentration within thin photoresist films was measured in-situ using contrast variant specular neutron reflectivity to characterize the initial swelling stage of the film dissolution. We find a substantial counterion depletion near the substrate and an enrichment near the periphery of the film extending into the solution. These observations challenge our understanding of the charge distribution in photoresist and polyelectrolyte films and are important for understanding film dissolution in medical and technological applications.

Original languageEnglish (US)
Article number34
Pages (from-to)292-301
Number of pages10
JournalProgress in Biomedical Optics and Imaging - Proceedings of SPIE
Volume5753
Issue numberI
DOIs
StatePublished - Sep 19 2005
EventAdvances in Resist Technology and Processing XXII - San Jose, CA, United States
Duration: Feb 28 2005Mar 2 2005

Fingerprint

photographic developers
Neutrons
Photoresists
photoresists
Thin films
thin films
dissolving
Dissolution
Charge distribution
Polyelectrolytes
swelling
charge distribution
Swelling
depletion
reflectance
neutrons
Substrates
profiles

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Biomaterials
  • Atomic and Molecular Physics, and Optics
  • Radiology Nuclear Medicine and imaging

Cite this

Prabhu, Vivek M. ; Vogt, Bryan D. ; Wu, Wen Li ; Douglas, Jack F. ; Lin, Eric K. ; Satija, Sushil K. ; Goldfarb, Dario L. ; Ito, Hiroshi. / Interfacial structure of photoresist thin films in developer solutions. In: Progress in Biomedical Optics and Imaging - Proceedings of SPIE. 2005 ; Vol. 5753, No. I. pp. 292-301.
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author = "Prabhu, {Vivek M.} and Vogt, {Bryan D.} and Wu, {Wen Li} and Douglas, {Jack F.} and Lin, {Eric K.} and Satija, {Sushil K.} and Goldfarb, {Dario L.} and Hiroshi Ito",
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Prabhu, VM, Vogt, BD, Wu, WL, Douglas, JF, Lin, EK, Satija, SK, Goldfarb, DL & Ito, H 2005, 'Interfacial structure of photoresist thin films in developer solutions', Progress in Biomedical Optics and Imaging - Proceedings of SPIE, vol. 5753, no. I, 34, pp. 292-301. https://doi.org/10.1117/12.598956

Interfacial structure of photoresist thin films in developer solutions. / Prabhu, Vivek M.; Vogt, Bryan D.; Wu, Wen Li; Douglas, Jack F.; Lin, Eric K.; Satija, Sushil K.; Goldfarb, Dario L.; Ito, Hiroshi.

In: Progress in Biomedical Optics and Imaging - Proceedings of SPIE, Vol. 5753, No. I, 34, 19.09.2005, p. 292-301.

Research output: Contribution to journalConference article

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AU - Prabhu, Vivek M.

AU - Vogt, Bryan D.

AU - Wu, Wen Li

AU - Douglas, Jack F.

AU - Lin, Eric K.

AU - Satija, Sushil K.

AU - Goldfarb, Dario L.

AU - Ito, Hiroshi

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AB - A depth profile of the base developer counterion concentration within thin photoresist films was measured in-situ using contrast variant specular neutron reflectivity to characterize the initial swelling stage of the film dissolution. We find a substantial counterion depletion near the substrate and an enrichment near the periphery of the film extending into the solution. These observations challenge our understanding of the charge distribution in photoresist and polyelectrolyte films and are important for understanding film dissolution in medical and technological applications.

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