TY - JOUR
T1 - Interplay between solution chemistry and mechanical activation in friction-induced material removal of silicon surface in aqueous solution
AU - Xiao, Chen
AU - Deng, Changbang
AU - Zhang, Peng
AU - Qian, Linmao
AU - Kim, Seong H.
N1 - Funding Information:
This work was supported by the Natural Science Foundation of China (Grant No. 51527901 and 51991373 ). S.H.K was supported by the National Science Foundation of the USA (Grant No. CMMI-1435766 ). The authors acknowledge Seung H. Hahn (Department of Mechanical and Nuclear Engineering, Pennsylvania State University) for helpful discussion of interfacial mechanochemical reactions.
Funding Information:
This work was supported by the Natural Science Foundation of China (Grant No. 51527901 and 51991373). S.H.K was supported by the National Science Foundation of the USA (Grant No. CMMI-1435766). The authors acknowledge Seung H. Hahn (Department of Mechanical and Nuclear Engineering, Pennsylvania State University) for helpful discussion of interfacial mechanochemical reactions.
Publisher Copyright:
© 2020
PY - 2020/8
Y1 - 2020/8
N2 - Shear-induced chemical etching reactions of single-crystalline Si(100), Si(110), and Si(111) surfaces were studied in acidic, neutral, and basic aqueous solutions. Measuring the applied load dependence of substrate etching yield and analyzing the data with the mechanically-assisted thermal activation model, the critical activation volume and activation barrier were determined for mechanochemical etching of three crystallographic surfaces. The pH dependence of Si(110) etching is quite distinct from those of Si(100) and Si(111). The results suggested that the mechanochemical activation effect is larger for Si(100) and Si(111) than Si(110) which is chemically more reactive than the other two surfaces. The findings of this study may provide deeper insights for mechanistic understanding of the scanning probe microscopy based nanomanufacturing and chemical mechanical polishing processes.
AB - Shear-induced chemical etching reactions of single-crystalline Si(100), Si(110), and Si(111) surfaces were studied in acidic, neutral, and basic aqueous solutions. Measuring the applied load dependence of substrate etching yield and analyzing the data with the mechanically-assisted thermal activation model, the critical activation volume and activation barrier were determined for mechanochemical etching of three crystallographic surfaces. The pH dependence of Si(110) etching is quite distinct from those of Si(100) and Si(111). The results suggested that the mechanochemical activation effect is larger for Si(100) and Si(111) than Si(110) which is chemically more reactive than the other two surfaces. The findings of this study may provide deeper insights for mechanistic understanding of the scanning probe microscopy based nanomanufacturing and chemical mechanical polishing processes.
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U2 - 10.1016/j.triboint.2020.106319
DO - 10.1016/j.triboint.2020.106319
M3 - Article
AN - SCOPUS:85082176891
SN - 0301-679X
VL - 148
JO - Tribology International
JF - Tribology International
M1 - 106319
ER -