Intrinsic limitations of atomic layer deposition for pseudocapacitive metal oxides in porous electrochemical capacitor electrodes

James S. Daubert, Ruocun Wang, Jennifer S. Ovental, Heather F. Barton, Ramakrishnan Rajagopalan, Veronica Augustyn, Gregory N. Parsons

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

By comparing the pseudocapacitive performance of ALD V2O5 in micro-, meso-, and macro-porous carbon electrodes, we describe the fundamental limits to ALD in very fine pores for pseudocapacitive charge storage. Comparing experimental trends with an ALD coating model, we find that the thermal V2O5 ALD process using vanadium triisopropoxide (VTIP) and water is unable to deposit in pores where the pore diameter is below a critical diameter of 13 Å. By adding the ALD V2O5 layer onto activated carbon electrodes, we find that the energy storage capacity could be increased by 144% for carbon with micropores and macropores, whereas for carbon black powder containing only macropores (i.e. a low surface area resulting in a relatively small starting capacity) the ALD coating increased the capacity more than 40-fold. To understand the ALD coating limits, the pores of the carbon electrodes were modeled as a series of connected tubes, and the volume of V2O5 deposited determined experimentally was compared to the calculated deposition limit. Pores below this critical diameter were sealed and decreased the accessible volume for V2O5 deposition by more than half, decreasing the maximum capacity. The effect of the pore sealing by the ALD process on the capacitive response of the activated carbon based electrodes was also studied. This work highlights the intrinsic capabilities and limitations of coating microporous materials using ALD.

Original languageEnglish (US)
Pages (from-to)13086-13097
Number of pages12
JournalJournal of Materials Chemistry A
Volume5
Issue number25
DOIs
StatePublished - Jan 1 2017

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Atomic layer deposition
Oxides
Capacitors
Metals
Coatings
Electrodes
Carbon
Activated carbon
Microporous materials
Soot
Carbon black
Vanadium
Energy storage
Macros
Deposits
Powders
vanadium pentoxide
Water

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Renewable Energy, Sustainability and the Environment
  • Materials Science(all)

Cite this

Daubert, James S. ; Wang, Ruocun ; Ovental, Jennifer S. ; Barton, Heather F. ; Rajagopalan, Ramakrishnan ; Augustyn, Veronica ; Parsons, Gregory N. / Intrinsic limitations of atomic layer deposition for pseudocapacitive metal oxides in porous electrochemical capacitor electrodes. In: Journal of Materials Chemistry A. 2017 ; Vol. 5, No. 25. pp. 13086-13097.
@article{7c749a7d42504526a013f57fe51e8ae2,
title = "Intrinsic limitations of atomic layer deposition for pseudocapacitive metal oxides in porous electrochemical capacitor electrodes",
abstract = "By comparing the pseudocapacitive performance of ALD V2O5 in micro-, meso-, and macro-porous carbon electrodes, we describe the fundamental limits to ALD in very fine pores for pseudocapacitive charge storage. Comparing experimental trends with an ALD coating model, we find that the thermal V2O5 ALD process using vanadium triisopropoxide (VTIP) and water is unable to deposit in pores where the pore diameter is below a critical diameter of 13 {\AA}. By adding the ALD V2O5 layer onto activated carbon electrodes, we find that the energy storage capacity could be increased by 144{\%} for carbon with micropores and macropores, whereas for carbon black powder containing only macropores (i.e. a low surface area resulting in a relatively small starting capacity) the ALD coating increased the capacity more than 40-fold. To understand the ALD coating limits, the pores of the carbon electrodes were modeled as a series of connected tubes, and the volume of V2O5 deposited determined experimentally was compared to the calculated deposition limit. Pores below this critical diameter were sealed and decreased the accessible volume for V2O5 deposition by more than half, decreasing the maximum capacity. The effect of the pore sealing by the ALD process on the capacitive response of the activated carbon based electrodes was also studied. This work highlights the intrinsic capabilities and limitations of coating microporous materials using ALD.",
author = "Daubert, {James S.} and Ruocun Wang and Ovental, {Jennifer S.} and Barton, {Heather F.} and Ramakrishnan Rajagopalan and Veronica Augustyn and Parsons, {Gregory N.}",
year = "2017",
month = "1",
day = "1",
doi = "10.1039/c7ta02719b",
language = "English (US)",
volume = "5",
pages = "13086--13097",
journal = "Journal of Materials Chemistry A",
issn = "2050-7488",
publisher = "Royal Society of Chemistry",
number = "25",

}

Intrinsic limitations of atomic layer deposition for pseudocapacitive metal oxides in porous electrochemical capacitor electrodes. / Daubert, James S.; Wang, Ruocun; Ovental, Jennifer S.; Barton, Heather F.; Rajagopalan, Ramakrishnan; Augustyn, Veronica; Parsons, Gregory N.

In: Journal of Materials Chemistry A, Vol. 5, No. 25, 01.01.2017, p. 13086-13097.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Intrinsic limitations of atomic layer deposition for pseudocapacitive metal oxides in porous electrochemical capacitor electrodes

AU - Daubert, James S.

AU - Wang, Ruocun

AU - Ovental, Jennifer S.

AU - Barton, Heather F.

AU - Rajagopalan, Ramakrishnan

AU - Augustyn, Veronica

AU - Parsons, Gregory N.

PY - 2017/1/1

Y1 - 2017/1/1

N2 - By comparing the pseudocapacitive performance of ALD V2O5 in micro-, meso-, and macro-porous carbon electrodes, we describe the fundamental limits to ALD in very fine pores for pseudocapacitive charge storage. Comparing experimental trends with an ALD coating model, we find that the thermal V2O5 ALD process using vanadium triisopropoxide (VTIP) and water is unable to deposit in pores where the pore diameter is below a critical diameter of 13 Å. By adding the ALD V2O5 layer onto activated carbon electrodes, we find that the energy storage capacity could be increased by 144% for carbon with micropores and macropores, whereas for carbon black powder containing only macropores (i.e. a low surface area resulting in a relatively small starting capacity) the ALD coating increased the capacity more than 40-fold. To understand the ALD coating limits, the pores of the carbon electrodes were modeled as a series of connected tubes, and the volume of V2O5 deposited determined experimentally was compared to the calculated deposition limit. Pores below this critical diameter were sealed and decreased the accessible volume for V2O5 deposition by more than half, decreasing the maximum capacity. The effect of the pore sealing by the ALD process on the capacitive response of the activated carbon based electrodes was also studied. This work highlights the intrinsic capabilities and limitations of coating microporous materials using ALD.

AB - By comparing the pseudocapacitive performance of ALD V2O5 in micro-, meso-, and macro-porous carbon electrodes, we describe the fundamental limits to ALD in very fine pores for pseudocapacitive charge storage. Comparing experimental trends with an ALD coating model, we find that the thermal V2O5 ALD process using vanadium triisopropoxide (VTIP) and water is unable to deposit in pores where the pore diameter is below a critical diameter of 13 Å. By adding the ALD V2O5 layer onto activated carbon electrodes, we find that the energy storage capacity could be increased by 144% for carbon with micropores and macropores, whereas for carbon black powder containing only macropores (i.e. a low surface area resulting in a relatively small starting capacity) the ALD coating increased the capacity more than 40-fold. To understand the ALD coating limits, the pores of the carbon electrodes were modeled as a series of connected tubes, and the volume of V2O5 deposited determined experimentally was compared to the calculated deposition limit. Pores below this critical diameter were sealed and decreased the accessible volume for V2O5 deposition by more than half, decreasing the maximum capacity. The effect of the pore sealing by the ALD process on the capacitive response of the activated carbon based electrodes was also studied. This work highlights the intrinsic capabilities and limitations of coating microporous materials using ALD.

UR - http://www.scopus.com/inward/record.url?scp=85021657584&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85021657584&partnerID=8YFLogxK

U2 - 10.1039/c7ta02719b

DO - 10.1039/c7ta02719b

M3 - Article

AN - SCOPUS:85021657584

VL - 5

SP - 13086

EP - 13097

JO - Journal of Materials Chemistry A

JF - Journal of Materials Chemistry A

SN - 2050-7488

IS - 25

ER -