Investigation of PVD-DLC thin films manufactured using HIPIMS etch / unbalanced magnetron sputter (UBM) deposition and secondary mechano-chemical modification

L. A. Donohue, A. Torosyan, P. May, Douglas Edward Wolfe, J. Kulik, Timothy John Eden

Research output: Contribution to specialist publicationArticle

6 Scopus citations

Abstract

PVD diamond-like-carbon (DLC) coatings are finding increasing industrial acceptance in automotive, aerospace and medical applications due to their reduced friction and low wear coefficient. Very recently, High Power Impulse Magnetron Sputter (HIPIMS) sources have been shown to produce fluxes with very high metal ion fractions similar to those produced by arc evaporation sources, without showing excessive heating and droplet formation characteristics. These new source properties now enable industrial-scale low temperature operation, low roughness and high efficiency etching of the substrate prior to deposition to deliver enhanced adhesion. In this paper, we report on the properties and performance of HIPIMS-etched titanium-containing DLC (Me-DLC) and metal-free (graphite-based) C-DLC films deposited at temperatures below 160°C.

Original languageEnglish (US)
Pages38-46
Number of pages9
Volume96
No2
Specialist publicationPlating and Surface Finishing
StatePublished - Mar 1 2009

All Science Journal Classification (ASJC) codes

  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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