Ion-beam assisted, electron-beam physical vapor deposition

Research output: Contribution to specialist publicationArticle

1 Citation (Scopus)

Abstract

Electron beam-physical vapor deposition (EB-PVD) is a relatively new technology that has overcome some of the difficulties associated with chemical vapor deposition, physical vapor deposition, and thermal spray processes. In the EB-PVD process, focused high-energy electron beams generated from electron guns are directed to melt and evaporate ingots, as well as preheat the substrate inside a vacuum chamber. By adding the assistance of ion beams to the process, coating density and adhesion are improved, while costs are reduced. This article describes ion-beam processes, explains the advantages of EB-PVD, shows how ion beams optimize the benefits of EB-PVD, and enumerates a variety of applications.

Original languageEnglish (US)
Pages27-28
Number of pages2
Volume150
No6
Specialist publicationAdvanced Materials and Processes
StatePublished - Dec 1996

Fingerprint

Physical vapor deposition
Ion beams
Electron beams
Electron guns
Ingots
Chemical vapor deposition
Adhesion
Vacuum
Coatings
Substrates
Costs

All Science Journal Classification (ASJC) codes

  • Materials Science(all)

Cite this

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title = "Ion-beam assisted, electron-beam physical vapor deposition",
abstract = "Electron beam-physical vapor deposition (EB-PVD) is a relatively new technology that has overcome some of the difficulties associated with chemical vapor deposition, physical vapor deposition, and thermal spray processes. In the EB-PVD process, focused high-energy electron beams generated from electron guns are directed to melt and evaporate ingots, as well as preheat the substrate inside a vacuum chamber. By adding the assistance of ion beams to the process, coating density and adhesion are improved, while costs are reduced. This article describes ion-beam processes, explains the advantages of EB-PVD, shows how ion beams optimize the benefits of EB-PVD, and enumerates a variety of applications.",
author = "Jogender Singh",
year = "1996",
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volume = "150",
pages = "27--28",
journal = "Advanced Materials and Processes",
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publisher = "ASM International",

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Ion-beam assisted, electron-beam physical vapor deposition. / Singh, Jogender.

In: Advanced Materials and Processes, Vol. 150, No. 6, 12.1996, p. 27-28.

Research output: Contribution to specialist publicationArticle

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