Ion-beam assisted, electron-beam physical vapor deposition

Research output: Contribution to specialist publicationArticle

1 Scopus citations

Abstract

Electron beam-physical vapor deposition (EB-PVD) is a relatively new technology that has overcome some of the difficulties associated with chemical vapor deposition, physical vapor deposition, and thermal spray processes. In the EB-PVD process, focused high-energy electron beams generated from electron guns are directed to melt and evaporate ingots, as well as preheat the substrate inside a vacuum chamber. By adding the assistance of ion beams to the process, coating density and adhesion are improved, while costs are reduced. This article describes ion-beam processes, explains the advantages of EB-PVD, shows how ion beams optimize the benefits of EB-PVD, and enumerates a variety of applications.

Original languageEnglish (US)
Pages27-28
Number of pages2
Volume150
No6
Specialist publicationAdvanced Materials and Processes
StatePublished - Dec 1996

All Science Journal Classification (ASJC) codes

  • Materials Science(all)

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