TY - JOUR
T1 - Ion radiation albedo effect
T2 - Influence of surface roughness on ion implantation and sputtering of materials
AU - Li, Yonggang
AU - Yang, Yang
AU - Short, Michael P.
AU - Ding, Zejun
AU - Zeng, Zhi
AU - Li, Ju
N1 - Funding Information:
This work was supported by the National Natural Science Foundation of China under Grant Nos. 11275229, 11475215 & NSAF U1230202, the key project of the National Science Foundation of China under Grant No. 11534012, the Special Funds for the Major State Basic Research Project of China (973) under Grant No. 2012CB933702, the Youth Innovation Promotion Association of CAS under Grant No. 2016386, and the Director Grants of CASHIPS. Part of the calculations were performed at the Center for Computational Science at CASHIPS, the ScGrid of the Supercomputing Center, and the Computer Network Information Center of the Chinese Academy of Sciences.
Publisher Copyright:
© 2016 IAEA, Vienna.
PY - 2017/1
Y1 - 2017/1
N2 - In fusion devices, ion retention and sputtering of materials are major concerns in the selection of compatible plasma-facing materials (PFMs), especially in the context of their microstructural conditions and surface morphologies. We demonstrate how surface roughness changes ion implantation and sputtering of materials under energetic ion irradiation. Using a new, sophisticated 3D Monte Carlo (MC) code, IM3D, and a random rough surface model, ion implantation and the sputtering yields of tungsten (W) with a surface roughness varying between 0-2 μm have been studied for irradiation by 0.1-1 keV D+, He+ and Ar+ ions. It is found that both ion backscattering and sputtering yields decrease with increasing roughness; this is hereafter called the ion radiation albedo effect. This effect is mainly dominated by the direct, line-of-sight deposition of a fraction of emitted atoms onto neighboring asperities. Backscattering and sputtering increase with more oblique irradiation angles. We propose a simple analytical formula to relate rough-surface and smooth-surface results.
AB - In fusion devices, ion retention and sputtering of materials are major concerns in the selection of compatible plasma-facing materials (PFMs), especially in the context of their microstructural conditions and surface morphologies. We demonstrate how surface roughness changes ion implantation and sputtering of materials under energetic ion irradiation. Using a new, sophisticated 3D Monte Carlo (MC) code, IM3D, and a random rough surface model, ion implantation and the sputtering yields of tungsten (W) with a surface roughness varying between 0-2 μm have been studied for irradiation by 0.1-1 keV D+, He+ and Ar+ ions. It is found that both ion backscattering and sputtering yields decrease with increasing roughness; this is hereafter called the ion radiation albedo effect. This effect is mainly dominated by the direct, line-of-sight deposition of a fraction of emitted atoms onto neighboring asperities. Backscattering and sputtering increase with more oblique irradiation angles. We propose a simple analytical formula to relate rough-surface and smooth-surface results.
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U2 - 10.1088/1741-4326/57/1/016038
DO - 10.1088/1741-4326/57/1/016038
M3 - Article
AN - SCOPUS:85007583979
VL - 57
JO - Nuclear Fusion
JF - Nuclear Fusion
SN - 0029-5515
IS - 1
M1 - 016038
ER -