Lift-off patterning of nano-crystalline quantum dot films

A. Sabeeh, Y. Thakur, Jerzy Ruzyllo

Research output: Chapter in Book/Report/Conference proceedingConference contribution

4 Scopus citations

Abstract

The paper is concerned with the effectiveness of the lift-off process in pattern definition of ultra-thin nanocrystalline quantum dot (NQD) films. The lift-off process is implemented and investigated in conjunction with mist deposition and spin coating of NQD films. The lift-off process is preformed in gas-phase (oxygen plasma exposure) and liquid-phase (acetone immersion). The results of NQD patterned films using lift-off process are presented and discussed in terms of performance of the lift-off medium (dry and wet), resolution of the pattern transfer process, as well as photoresist thickness. It demonstrates that while fully compatible with the mist deposition, the patterning scheme proposed is not compatible with spin coating of NQDs films.

Original languageEnglish (US)
Title of host publicationLow-Dimensional Nanoscale Electronic and Photonic Devices 8
EditorsS. Jin, G. W. Hunter, K. Takei, J. H. He, M. Suzuki, J. C. Ho, Q. Li, S. W. Kim, Y. L. Chueh, C. O'Dwyer, Z. Fan
PublisherElectrochemical Society Inc.
Pages53-57
Number of pages5
Edition12
ISBN (Electronic)9781607685395
DOIs
StatePublished - Jan 1 2015
EventSymposium on Low-Dimensional Nanoscale Electronic and Photonic Devices 8 - 228th ECS Meeting - Phoenix, United States
Duration: Oct 11 2015Oct 15 2015

Publication series

NameECS Transactions
Number12
Volume69
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

Other

OtherSymposium on Low-Dimensional Nanoscale Electronic and Photonic Devices 8 - 228th ECS Meeting
CountryUnited States
CityPhoenix
Period10/11/1510/15/15

All Science Journal Classification (ASJC) codes

  • Engineering(all)

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