Light pressure on chiral sculptured thin films and the circular Bragg phenomenon

Benjamin M. Ross, Akhlesh Lakhtakia

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

For a circularly polarized plane wave incident normally on a chiral sculptured thin film (STF), we determined that light pressure per unit thickness on the film is high when the incident plane wave and the chiral STF are co-handed, the loss factor in the chiral STF is as low as possible, the wavelength is either the center-wavelength of the Bragg regime or close to it, and the ratio of the film thickness normalized by the period is moderately high.

Original languageEnglish (US)
Pages (from-to)7-12
Number of pages6
JournalOptik
Volume119
Issue number1
DOIs
StatePublished - Jan 7 2008

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illuminance
Thin films
plane waves
thin films
Wavelength
wavelengths
Film thickness
film thickness

All Science Journal Classification (ASJC) codes

  • Atomic and Molecular Physics, and Optics

Cite this

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Light pressure on chiral sculptured thin films and the circular Bragg phenomenon. / Ross, Benjamin M.; Lakhtakia, Akhlesh.

In: Optik, Vol. 119, No. 1, 07.01.2008, p. 7-12.

Research output: Contribution to journalArticle

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