Local inclination angle: A key structural factor in emission from chiral sculptured thin films

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Abstract

Sculptured thin films (STFs) are unidirectionally nonhomogeneous, anisotropic, porous, nanoengineered materials possessing morphological features of optically significant dimensions. Light emission efficiencies of chiral STFs are examined to establish the role of a key structural factor: the local inclination angle χ of the morphology. The centrality of its so-called pseudo-isotropic value χpi is identified. When the source configuration has the same handedness as the chiral STF, the emission spectrum is spread over the Bragg regime if χ is in the neighborhood of χpi; otherwise, the emission spectrum is highly localized in the short-wavelength (resp. long-wavelength) vicinity of the Bragg regime for χ>χpi (resp. χ<χpi). In contrast, the emission spectrum is spread over the entire Bragg regime for the contra-wound source configuration, regardless of the value of χ. High emission efficiencies require that χ be considerably less than χpi.

Original languageEnglish (US)
Pages (from-to)103-111
Number of pages9
JournalOptics Communications
Volume202
Issue number1-3
DOIs
Publication statusPublished - Feb 1 2002

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All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Physical and Theoretical Chemistry
  • Electrical and Electronic Engineering

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