Low-temperature metalorganic chemical vapor deposition of molybdenum disulfide on multicomponent glass substrates

Nicholas A. Simonson, Joseph R. Nasr, Shruti Subramanian, Bhakti Jariwala, Rui Zhao, Saptarshi Das, Joshua Alexander Robinson

Research output: Contribution to journalArticle

Abstract

Industrially relevant substrates, such as amorphous oxides and metallic substrates, typically cannot withstand the elevated temperatures (>800 °C) required for metalorganic chemical vapor deposition (MOCVD), thus limiting the applicability of these substrates for the realization of electronic-grade 2D materials. This work demonstrates MOCVD of crystalline MoS 2 on multicomponent glass at temperatures ranging from 400 to 600 °C. Incorporated to understand the effects of ions in the glass on 2D layer growth, nitrogen plasma treatment of the glass surface enables increased domain size and minimized the effects of low temperature on electronic characteristics. Trends of growth morphology, crystalline quality, and film stoichiometry are examined as a function of glass chemistry, growth temperature, and degree of surface treatment. It is found that glass surface chemistry and growth temperature are the dominant factors in controlling domain size, which is improved with increasing plasma treatment, introducing alkali-containing glass, and growth temperature. While crystalline quality is improved with higher temperature, the films no longer remain stoichiometric. Finally, we demonstrate that glass surface chemistry has important impacts on electronic transport properties.

Original languageEnglish (US)
Pages (from-to)32-37
Number of pages6
JournalFlatChem
Volume11
DOIs
StatePublished - Sep 1 2018

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Metallorganic chemical vapor deposition
Molybdenum
Glass
Substrates
Growth temperature
Temperature
Crystalline materials
Surface chemistry
Nitrogen plasma
Alkalies
molybdenum disulfide
Stoichiometry
Transport properties
Oxides
Surface treatment
Ions
Plasmas

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Ceramics and Composites
  • Surfaces, Coatings and Films
  • Materials Chemistry

Cite this

Simonson, Nicholas A. ; Nasr, Joseph R. ; Subramanian, Shruti ; Jariwala, Bhakti ; Zhao, Rui ; Das, Saptarshi ; Robinson, Joshua Alexander. / Low-temperature metalorganic chemical vapor deposition of molybdenum disulfide on multicomponent glass substrates. In: FlatChem. 2018 ; Vol. 11. pp. 32-37.
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Low-temperature metalorganic chemical vapor deposition of molybdenum disulfide on multicomponent glass substrates. / Simonson, Nicholas A.; Nasr, Joseph R.; Subramanian, Shruti; Jariwala, Bhakti; Zhao, Rui; Das, Saptarshi; Robinson, Joshua Alexander.

In: FlatChem, Vol. 11, 01.09.2018, p. 32-37.

Research output: Contribution to journalArticle

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