Maskless fabrication of nanowells using chemically reactive colloids

Neetu Chaturvedi, Erik Hsiao, Darrell Velegol, Seong Kim

Research output: Contribution to journalArticle

16 Citations (Scopus)

Abstract

This letter describes the maskless fabrication of nanowells on a silicon substrate using chemically reactive nanoparticles. The amidine-functionalized polystyrene latex (APSL) colloids are adhered onto a silicon wafer, and hydrolysis of the particles' amidine groups generates the ammonium hydroxide etchant locally. The localized release of reactive species and its fast diffusion into the bulk liquid ensure that the silicon etching takes place only under the APSL colloids. Thus, the basal length of the nanowells is precisely controlled by the diameter of the APSL particles. The shape of the nanowells depends on the structure of the substrate: inverted pyramids on silicon (100) and hexagonal pits on silicon (111). The method described here provides an easy, inexpensive, safe, and high-throughput approach for generating nanowells on silicon surfaces. This maskless and simple nanofabrication method will open doors for new applications with locally generated or locally delivered chemistry from nanoparticles.

Original languageEnglish (US)
Pages (from-to)672-676
Number of pages5
JournalNano letters
Volume11
Issue number2
DOIs
StatePublished - Feb 9 2011

Fingerprint

Amidines
Colloids
Silicon
colloids
Fabrication
fabrication
Latexes
silicon
latex
Polystyrenes
polystyrene
Ammonium Hydroxide
Nanoparticles
Ammonium hydroxide
Substrates
nanoparticles
Silicon wafers
Nanotechnology
etchants
nanofabrication

All Science Journal Classification (ASJC) codes

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanical Engineering

Cite this

Chaturvedi, Neetu ; Hsiao, Erik ; Velegol, Darrell ; Kim, Seong. / Maskless fabrication of nanowells using chemically reactive colloids. In: Nano letters. 2011 ; Vol. 11, No. 2. pp. 672-676.
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Maskless fabrication of nanowells using chemically reactive colloids. / Chaturvedi, Neetu; Hsiao, Erik; Velegol, Darrell; Kim, Seong.

In: Nano letters, Vol. 11, No. 2, 09.02.2011, p. 672-676.

Research output: Contribution to journalArticle

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