Maskless fabrication of polythiophene patterns by photochemical conversion of regioselectively condensed 2,5-diiodothiophene

Sudarshan Natarajan, Seong H. Kim

Research output: Contribution to journalArticlepeer-review

27 Scopus citations

Abstract

Maskless fabrication of periodic patterns of a conjugated polymer is achieved by regioselective condensation of 2,5-diiodothiophene on chemically patterned substrate surfaces followed by in situ photochemical conversion of the condensed molecules into oligothiophenes and polythiophenes. This approach utilizes preferential aggregation of monomer molecules on the substrate that is periodically patterned with wetting regions surrounded by nonwetting regions. Since the monomer molecules are confined in the specific regions on the substrate, the polymer patterns can be produced at those locations by blanket irradiation of UV light without mask. The effects of wettability contrast and the dimension of periodicity are important factors for good pattern recognition during the monomer deposition.

Original languageEnglish (US)
Pages (from-to)7052-7056
Number of pages5
JournalLangmuir
Volume21
Issue number15
DOIs
StatePublished - Jul 19 2005

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Spectroscopy
  • Electrochemistry

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