Mass spectrometry study during the vapor deposition of poly-para-xylylene thin films

J. B. Fortin, T. M. Lu

Research output: Contribution to journalConference article

31 Scopus citations

Abstract

The vapor species present in the deposition chamber during the vapor deposition of poly-para-xylylene (Parylene) thin films was analyzed using a differentially pumped quadrupole mass spectrometer (DPQMS). The partial pressure in the deposition chamber of volatile contamination originating in the dimer source, di-para-xylylene, was determined. The magnitude of the contamination was determined and its mass spectrum was analyzed using the DPQMS. Fragmentation patterns for the monomer were determined as a function of quadruple mass spectrometer (QMS) ionizing electron energy for energies ranging from 25 to 105 eV.

Original languageEnglish (US)
Pages (from-to)2459-2465
Number of pages7
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume18
Issue number5
DOIs
Publication statusPublished - Sep 1 2000
Event47th International Symposium: Vacuum, Thin Films, Surfaces/Interfaces, and Processing - Boston, USA
Duration: Oct 2 2000Oct 6 2000

    Fingerprint

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Cite this