Maximizing net light pressure on a chiral sculptured thin film by selection of the vapor incidence angle

Benjamin M. Ross, Akhlesh Lakhtakia

Research output: Contribution to journalArticlepeer-review

2 Scopus citations

Abstract

The net light pressure on a chiral sculptured thin film, for normal incidence, can be maximized by appropriately choosing the vapor incidence angle during the fabrication of the film by physical vapor deposition.

Original languageEnglish (US)
Pages (from-to)1407-1409
Number of pages3
JournalMicrowave and Optical Technology Letters
Volume49
Issue number6
DOIs
StatePublished - Jun 1 2007

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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