Measurements of the reaction-diffusion front of model chemically amplified photoresists with varying photoacid size

Bryan D. Vogt, Shuhui Kang, Vivek M. Prabhu, Eric K. Lin, Sushil K. Satija, Karen Turnquest, Wen Li Wu

Research output: Contribution to journalArticlepeer-review

34 Scopus citations

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Chemical Compounds

Engineering & Materials Science