Mems spatial light modulator for optical maskless lithography

V. A. Aksyuk, D. López, G. P. Watson, M. E. Simon, R. A. Cirelli, F. Pardo, F. Klemens, A. R. Papazian, C. Bolle, J. E. Bower, E. Ferry, W. M. Mansfield, J. Miner, T. W. Sorsch, D. Tennant

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

128x512 arrays of electrostatically actuated piston micromirrors with 3 um and 5 um individual pixels and 90% optical fill factor are realized using a polysilicon surface micromachining process with 5 structural layers and 130nm minimum features. To modulate Deep Ultraviolet (DUV) radiation for Optical Maskless Lithography application, continuously controlled vertical motion of 80nm is achieved at less than 4V. The micromirror response time is less than 10 microseconds. A wiring layer is used to actuate subarrays of up to 128x128 mirrors at the same time in linear gratings, checkerboards and other patterns.

Original languageEnglish (US)
Title of host publication2006 Solid-State Sensors, Actuators, and Microsystems Workshop, Hilton Head 2006
EditorsThomas W. Kenny, Leland Spangler
PublisherTransducer Research Foundation
Pages11-14
Number of pages4
ISBN (Electronic)0964002469, 9780964002463
StatePublished - 2006
Event13th Solid-State Sensors, Actuators, and Microsystems Workshop, Hilton Head 2006 - Hilton Head Island, United States
Duration: Jun 4 2006Jun 8 2006

Publication series

NameTechnical Digest - Solid-State Sensors, Actuators, and Microsystems Workshop

Conference

Conference13th Solid-State Sensors, Actuators, and Microsystems Workshop, Hilton Head 2006
CountryUnited States
CityHilton Head Island
Period6/4/066/8/06

All Science Journal Classification (ASJC) codes

  • Control and Systems Engineering
  • Electrical and Electronic Engineering
  • Hardware and Architecture

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