Metalorganic chemical vapor deposition of N-polar GaN films on vicinal SiC substrates using indium surfactants

Dongjin Won, Xiaojun Weng, Joan Marie Redwing

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Abstract

The effect of indium surfactants on the growth of N-polar GaN films on vicinal C-face SiC substrates by metalorganic chemical vapor deposition was investigated. Triangular hillocks formed on the surface of N-polar GaN without indium, resulting in a rough surface. When indium surfactants were introduced during GaN growth, the surface roughness was reduced from 18.1 to 3.5 nm over a 20 × 20 μm 2 area. The photoluminescence characteristics of N-polar GaN film were also improved because of a reduction of carbon caused by the presence of indium, demonstrating that indium is a useful surfactant in the growth of N-polar GaN.

Original languageEnglish (US)
Article number021913
JournalApplied Physics Letters
Volume100
Issue number2
DOIs
Publication statusPublished - Jan 9 2012

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All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

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