Metalorganic chemical vapor deposition Pb(Zr,Ti)O3 and selected lower electrode structures as a pathway to integrated piezoelectric microelectromechanical systems

Ing Shin Chen, Jeffrey F. Roeder, Dong Joo Kim, Jon Paul Maria, Angus I. Kingon

Research output: Contribution to journalArticlepeer-review

8 Scopus citations

Abstract

The preparation of PZT thin films on silicon substrates by metallorganic chemical vapor deposition (MOCVD) method was discussed. The lower electrode structures compatiable with MOVCD of PZT were developed to prevent iridium silicidation and promote adhesion. The successful demonstration of high quality piezoelectric PZT by MOVCD on the lower electrode structures indicated the viability of MOVCD approach for providing a pathway to integrated piezoelectric micromachined devices.

Original languageEnglish (US)
Pages (from-to)1833-1840
Number of pages8
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume19
Issue number5
DOIs
StatePublished - Sep 1 2001

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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