Methods of patterned mist deposition of nano-crystalline quantum dot films

A. Sabeeh; Y. Thakur; J. H. Chao; A. Kshirsagar; Jerzy Ruzyllo

doi:10.1149/06443.0001

Methods of patterned mist deposition of nano-crystalline quantum dot films

A. Sabeeh, Y. Thakur, J. H. Chao, A. Kshirsagar, Jerzy Ruzyllo

Materials Research Institute (MRI)

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

3 Scopus citations

Abstract

This paper is concerned with patterning of ultra-thin films formed by means of mist deposition technique using colloidal solutions of nanocrystalline quantum dots (NQDs). It discusses patterns created using mechanical masks as well as area selective bottom-up growth of quantum dot films which follows patterns created by means of pre-mist deposition surface functionalization. A new method of nanocrystalline quantum dot film patterning by means of a lift-off process is proposed and investigated. The results obtained show effectiveness of both gas-phase (oxygen plasma) and liquid-phase (acetone) based lift-off steps in forming NQD patterns with the resolution defined by the resolution of the photolithographic process used to pattern photoresist.

Original language	English (US)
Title of host publication	Low-Dimensional Nanoscale Electronic and Photonic Devices 7
Editors	S. W. Kim, Y. L. Chueh, S. Jin, Z. Fan, J. C. Ho, G. W. Hunter, M. Suzuki
Publisher	Electrochemical Society Inc.
Pages	1-5
Number of pages	5
Volume	64
Edition	43
ISBN (Electronic)	9781607685395
DOIs	https://doi.org/10.1149/06443.0001
State	Published - Jan 1 2014
Event	Symposium on Low-Dimensional Nanoscale Electronic and Photonic Devices 7 - 2014 ECS and SMEQ Joint International Meeting - Cancun, Mexico Duration: Oct 5 2014 → Oct 9 2014

Other

Other	Symposium on Low-Dimensional Nanoscale Electronic and Photonic Devices 7 - 2014 ECS and SMEQ Joint International Meeting
Country/Territory	Mexico
City	Cancun
Period	10/5/14 → 10/9/14

All Science Journal Classification (ASJC) codes

Engineering(all)

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10.1149/06443.0001

Cite this

Sabeeh, A., Thakur, Y., Chao, J. H., Kshirsagar, A., & Ruzyllo, J. (2014). Methods of patterned mist deposition of nano-crystalline quantum dot films. In S. W. Kim, Y. L. Chueh, S. Jin, Z. Fan, J. C. Ho, G. W. Hunter, & M. Suzuki (Eds.), Low-Dimensional Nanoscale Electronic and Photonic Devices 7 (43 ed., Vol. 64, pp. 1-5). Electrochemical Society Inc.. https://doi.org/10.1149/06443.0001

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title = "Methods of patterned mist deposition of nano-crystalline quantum dot films",

abstract = "This paper is concerned with patterning of ultra-thin films formed by means of mist deposition technique using colloidal solutions of nanocrystalline quantum dots (NQDs). It discusses patterns created using mechanical masks as well as area selective bottom-up growth of quantum dot films which follows patterns created by means of pre-mist deposition surface functionalization. A new method of nanocrystalline quantum dot film patterning by means of a lift-off process is proposed and investigated. The results obtained show effectiveness of both gas-phase (oxygen plasma) and liquid-phase (acetone) based lift-off steps in forming NQD patterns with the resolution defined by the resolution of the photolithographic process used to pattern photoresist.",

author = "A. Sabeeh and Y. Thakur and Chao, {J. H.} and A. Kshirsagar and Jerzy Ruzyllo",

year = "2014",

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publisher = "Electrochemical Society Inc.",

edition = "43",

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Sabeeh, A, Thakur, Y, Chao, JH, Kshirsagar, A & Ruzyllo, J 2014, Methods of patterned mist deposition of nano-crystalline quantum dot films. in SW Kim, YL Chueh, S Jin, Z Fan, JC Ho, GW Hunter & M Suzuki (eds), Low-Dimensional Nanoscale Electronic and Photonic Devices 7. 43 edn, vol. 64, Electrochemical Society Inc., pp. 1-5, Symposium on Low-Dimensional Nanoscale Electronic and Photonic Devices 7 - 2014 ECS and SMEQ Joint International Meeting, Cancun, Mexico, 10/5/14. https://doi.org/10.1149/06443.0001

Methods of patterned mist deposition of nano-crystalline quantum dot films. / Sabeeh, A.; Thakur, Y.; Chao, J. H. et al.

Low-Dimensional Nanoscale Electronic and Photonic Devices 7. ed. / S. W. Kim; Y. L. Chueh; S. Jin; Z. Fan; J. C. Ho; G. W. Hunter; M. Suzuki. Vol. 64 43. ed. Electrochemical Society Inc., 2014. p. 1-5.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

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T1 - Methods of patterned mist deposition of nano-crystalline quantum dot films

AU - Sabeeh, A.

AU - Thakur, Y.

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N2 - This paper is concerned with patterning of ultra-thin films formed by means of mist deposition technique using colloidal solutions of nanocrystalline quantum dots (NQDs). It discusses patterns created using mechanical masks as well as area selective bottom-up growth of quantum dot films which follows patterns created by means of pre-mist deposition surface functionalization. A new method of nanocrystalline quantum dot film patterning by means of a lift-off process is proposed and investigated. The results obtained show effectiveness of both gas-phase (oxygen plasma) and liquid-phase (acetone) based lift-off steps in forming NQD patterns with the resolution defined by the resolution of the photolithographic process used to pattern photoresist.

AB - This paper is concerned with patterning of ultra-thin films formed by means of mist deposition technique using colloidal solutions of nanocrystalline quantum dots (NQDs). It discusses patterns created using mechanical masks as well as area selective bottom-up growth of quantum dot films which follows patterns created by means of pre-mist deposition surface functionalization. A new method of nanocrystalline quantum dot film patterning by means of a lift-off process is proposed and investigated. The results obtained show effectiveness of both gas-phase (oxygen plasma) and liquid-phase (acetone) based lift-off steps in forming NQD patterns with the resolution defined by the resolution of the photolithographic process used to pattern photoresist.

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A2 - Kim, S. W.

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Y2 - 5 October 2014 through 9 October 2014

ER -

Methods of patterned mist deposition of nano-crystalline quantum dot films

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