Micro- and macroscopic modeling of sputter depth profiling

Dawid Maciazek, Robert J. Paruch, Zbigniew Postawa, Barbara J. Garrison

Research output: Contribution to journalArticle

4 Scopus citations

Abstract

A model for predicting depth profiles due to energetic particle bombardment based on the RMS roughness of the system and the sputtering yield is proposed. The model is an extension of the macroscopic transport model proposed previously [Tuccitto, N.; Zappala, G.; Vitale, S.; Torrisi, A.; Licciardello, A. J. Phys. Chem. C 2016, 120, 9263-9269]. The model is used to reconstruct the experimental depth profiles of a NiCr heterostructure due to bombardment by C60, SF5, O2, and Ga.

Original languageEnglish (US)
Pages (from-to)25473-25480
Number of pages8
JournalJournal of Physical Chemistry C
Volume120
Issue number44
DOIs
Publication statusPublished - Nov 10 2016

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All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Energy(all)
  • Physical and Theoretical Chemistry
  • Surfaces, Coatings and Films

Cite this

Maciazek, D., Paruch, R. J., Postawa, Z., & Garrison, B. J. (2016). Micro- and macroscopic modeling of sputter depth profiling. Journal of Physical Chemistry C, 120(44), 25473-25480. https://doi.org/10.1021/acs.jpcc.6b09228