In this work the process of mist deposition is explored as a method used to deposit organic semiconductors and gate dielectrics for TFTs. With an expanding use of TFTs in both electronic and photonic applications mist deposition offers advantages in terms of versatility, throughput and process cost. The method of mist deposition is first introduced and then example of results obtained with mist deposited dielectric and semiconductors thin films are discussed. copyright The Electrochemical Society.
|Original language||English (US)|
|Number of pages||5|
|State||Published - Dec 1 2006|
|Event||Thin Film Transistor Technologies 8 - 210th Electrochemical Society Meeting - Cancun, Mexico|
Duration: Oct 29 2006 → Nov 3 2006
All Science Journal Classification (ASJC) codes