Mist deposition for TFT technology

K. Shanmugasundaram, S. C. Price, K. Chang, D. O. Lee, J. Ruzyllo

Research output: Contribution to journalConference article

2 Scopus citations

Abstract

In this work the process of mist deposition is explored as a method used to deposit organic semiconductors and gate dielectrics for TFTs. With an expanding use of TFTs in both electronic and photonic applications mist deposition offers advantages in terms of versatility, throughput and process cost. The method of mist deposition is first introduced and then example of results obtained with mist deposited dielectric and semiconductors thin films are discussed. copyright The Electrochemical Society.

Original languageEnglish (US)
Pages (from-to)255-259
Number of pages5
JournalECS Transactions
Volume3
Issue number8
DOIs
StatePublished - Dec 1 2006
EventThin Film Transistor Technologies 8 - 210th Electrochemical Society Meeting - Cancun, Mexico
Duration: Oct 29 2006Nov 3 2006

All Science Journal Classification (ASJC) codes

  • Engineering(all)

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    Shanmugasundaram, K., Price, S. C., Chang, K., Lee, D. O., & Ruzyllo, J. (2006). Mist deposition for TFT technology. ECS Transactions, 3(8), 255-259. https://doi.org/10.1149/1.2356361