Mist deposition in semiconductor device manufacturing

Paul Mumbauer, M. Brubaker, P. Roman, R. Grant, K. Chang, W. Mahoney, D. O. Lee, K. Shanmugasundaram, Jerzy Ruzyllo

Research output: Contribution to journalArticle

9 Scopus citations

Abstract

The feasibility of mist deposition in the formation of very thin films in advanced nanoelectronic and photonic manufacturing, using liquid precursors, is discussed. In both cases of photoresist and high-k dielectric processing, deposition is well controlled and produced uniform, mechanically coherent films, even in the ultrathin thickness regime. The method is independent of the shape of the substrate. Mist deposition has the potential to supplement spin-on process in those applications in which effectiveness of the latter will be determined.

Original languageEnglish (US)
Pages (from-to)75-80
Number of pages6
JournalSemiconductor International
Volume27
Issue number12
StatePublished - Nov 1 2004

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Microbiology
  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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  • Cite this

    Mumbauer, P., Brubaker, M., Roman, P., Grant, R., Chang, K., Mahoney, W., Lee, D. O., Shanmugasundaram, K., & Ruzyllo, J. (2004). Mist deposition in semiconductor device manufacturing. Semiconductor International, 27(12), 75-80.