Mist deposition in semiconductor device manufacturing

Paul Mumbauer, M. Brubaker, P. Roman, R. Grant, K. Chang, W. Mahoney, D. O. Lee, K. Shanmugasundaram, Jerzy Ruzyllo

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

The feasibility of mist deposition in the formation of very thin films in advanced nanoelectronic and photonic manufacturing, using liquid precursors, is discussed. In both cases of photoresist and high-k dielectric processing, deposition is well controlled and produced uniform, mechanically coherent films, even in the ultrathin thickness regime. The method is independent of the shape of the substrate. Mist deposition has the potential to supplement spin-on process in those applications in which effectiveness of the latter will be determined.

Original languageEnglish (US)
Pages (from-to)75-80
Number of pages6
JournalSemiconductor International
Volume27
Issue number12
StatePublished - Nov 1 2004

Fingerprint

Optics and Photonics
mist
Semiconductors
Fog
Semiconductor devices
semiconductor devices
manufacturing
Equipment and Supplies
Nanoelectronics
supplements
Photoresists
photoresists
Photonics
photonics
Thin films
Liquids
Substrates
liquids
thin films
Processing

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Microbiology
  • Condensed Matter Physics
  • Electrical and Electronic Engineering

Cite this

Mumbauer, P., Brubaker, M., Roman, P., Grant, R., Chang, K., Mahoney, W., ... Ruzyllo, J. (2004). Mist deposition in semiconductor device manufacturing. Semiconductor International, 27(12), 75-80.
Mumbauer, Paul ; Brubaker, M. ; Roman, P. ; Grant, R. ; Chang, K. ; Mahoney, W. ; Lee, D. O. ; Shanmugasundaram, K. ; Ruzyllo, Jerzy. / Mist deposition in semiconductor device manufacturing. In: Semiconductor International. 2004 ; Vol. 27, No. 12. pp. 75-80.
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Mumbauer, P, Brubaker, M, Roman, P, Grant, R, Chang, K, Mahoney, W, Lee, DO, Shanmugasundaram, K & Ruzyllo, J 2004, 'Mist deposition in semiconductor device manufacturing', Semiconductor International, vol. 27, no. 12, pp. 75-80.

Mist deposition in semiconductor device manufacturing. / Mumbauer, Paul; Brubaker, M.; Roman, P.; Grant, R.; Chang, K.; Mahoney, W.; Lee, D. O.; Shanmugasundaram, K.; Ruzyllo, Jerzy.

In: Semiconductor International, Vol. 27, No. 12, 01.11.2004, p. 75-80.

Research output: Contribution to journalArticle

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AU - Mumbauer, Paul

AU - Brubaker, M.

AU - Roman, P.

AU - Grant, R.

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AU - Shanmugasundaram, K.

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AB - The feasibility of mist deposition in the formation of very thin films in advanced nanoelectronic and photonic manufacturing, using liquid precursors, is discussed. In both cases of photoresist and high-k dielectric processing, deposition is well controlled and produced uniform, mechanically coherent films, even in the ultrathin thickness regime. The method is independent of the shape of the substrate. Mist deposition has the potential to supplement spin-on process in those applications in which effectiveness of the latter will be determined.

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Mumbauer P, Brubaker M, Roman P, Grant R, Chang K, Mahoney W et al. Mist deposition in semiconductor device manufacturing. Semiconductor International. 2004 Nov 1;27(12):75-80.