In this work the process of mist deposition is explored as a method used to deposit organic semiconductors for applications in OLEDs. The deposition kinetics of a specially formulated hole transport agent (AG 1) from Agiltron were studied. The results indicate that the mist deposited film thickness varies linearly with precursor concentration, deposition time, and substrate potential. AFM characterization shows distinct stages in the film evolution process. The growth of secondary layers was observed before the formation of a complete initial film layer. A working blue OLED with the hole transport and photo emissive layers deposited by mist deposition was demonstrated.