Modeling chemical vapor deposition (CVD) diamond film growth with diamantane-derived radicals in solution: Permissive evidence in support of the Garrison-Brenner mechanism for incorporation of carbon into the dimer sites of the {100} diamond surface

Ken S. Feldman, Robert F. Campbell, Theodore R. West, Allen D. Aloise, David Giampetro

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Abstract

The synthesis and partial rearrangement of nordiamantanemethyl radical into its more stable diamantyl isomer at 200-300 °C is reported. This solution phase observation attests to the feasibility of similar processes proposed to occur at the surface of {100} diamond film under CVD conditions.

Original languageEnglish (US)
Pages (from-to)7612-7617
Number of pages6
JournalJournal of Organic Chemistry
Volume64
Issue number20
DOIs
Publication statusPublished - Oct 1 1999

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All Science Journal Classification (ASJC) codes

  • Organic Chemistry

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