Modeling chemical vapor deposition (CVD) diamond film growth with diamantane-derived radicals in solution: Permissive evidence in support of the Garrison-Brenner mechanism for incorporation of carbon into the dimer sites of the {100} diamond surface

Ken S. Feldman; Robert F. Campbell; Theodore R. West; Allen D. Aloise; David Giampetro

doi:10.1021/jo9911793

Modeling chemical vapor deposition (CVD) diamond film growth with diamantane-derived radicals in solution: Permissive evidence in support of the Garrison-Brenner mechanism for incorporation of carbon into the dimer sites of the {100} diamond surface

Ken S. Feldman, Robert F. Campbell, Theodore R. West, Allen D. Aloise, David Giampetro

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

Abstract

The synthesis and partial rearrangement of nordiamantanemethyl radical into its more stable diamantyl isomer at 200-300 °C is reported. This solution phase observation attests to the feasibility of similar processes proposed to occur at the surface of {100} diamond film under CVD conditions.

Original language	English (US)
Pages (from-to)	7612-7617
Number of pages	6
Journal	Journal of Organic Chemistry
Volume	64
Issue number	20
DOIs	https://doi.org/10.1021/jo9911793
State	Published - Oct 1 1999

All Science Journal Classification (ASJC) codes

Organic Chemistry

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Feldman, K. S., Campbell, R. F., West, T. R., Aloise, A. D., & Giampetro, D. (1999). Modeling chemical vapor deposition (CVD) diamond film growth with diamantane-derived radicals in solution: Permissive evidence in support of the Garrison-Brenner mechanism for incorporation of carbon into the dimer sites of the {100} diamond surface. Journal of Organic Chemistry, 64(20), 7612-7617. https://doi.org/10.1021/jo9911793

Feldman, Ken S. ; Campbell, Robert F. ; West, Theodore R. ; Aloise, Allen D. ; Giampetro, David. / Modeling chemical vapor deposition (CVD) diamond film growth with diamantane-derived radicals in solution : Permissive evidence in support of the Garrison-Brenner mechanism for incorporation of carbon into the dimer sites of the {100} diamond surface. In: Journal of Organic Chemistry. 1999 ; Vol. 64, No. 20. pp. 7612-7617.

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abstract = "The synthesis and partial rearrangement of nordiamantanemethyl radical into its more stable diamantyl isomer at 200-300 °C is reported. This solution phase observation attests to the feasibility of similar processes proposed to occur at the surface of {100} diamond film under CVD conditions.",

author = "Feldman, {Ken S.} and Campbell, {Robert F.} and West, {Theodore R.} and Aloise, {Allen D.} and David Giampetro",

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Feldman, KS, Campbell, RF, West, TR, Aloise, AD & Giampetro, D 1999, 'Modeling chemical vapor deposition (CVD) diamond film growth with diamantane-derived radicals in solution: Permissive evidence in support of the Garrison-Brenner mechanism for incorporation of carbon into the dimer sites of the {100} diamond surface', Journal of Organic Chemistry, vol. 64, no. 20, pp. 7612-7617. https://doi.org/10.1021/jo9911793

Modeling chemical vapor deposition (CVD) diamond film growth with diamantane-derived radicals in solution : Permissive evidence in support of the Garrison-Brenner mechanism for incorporation of carbon into the dimer sites of the {100} diamond surface. / Feldman, Ken S.; Campbell, Robert F.; West, Theodore R.; Aloise, Allen D.; Giampetro, David.

In: Journal of Organic Chemistry, Vol. 64, No. 20, 01.10.1999, p. 7612-7617.

Research output: Contribution to journal › Article › peer-review

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T1 - Modeling chemical vapor deposition (CVD) diamond film growth with diamantane-derived radicals in solution

T2 - Permissive evidence in support of the Garrison-Brenner mechanism for incorporation of carbon into the dimer sites of the {100} diamond surface

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AU - Aloise, Allen D.

AU - Giampetro, David

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AB - The synthesis and partial rearrangement of nordiamantanemethyl radical into its more stable diamantyl isomer at 200-300 °C is reported. This solution phase observation attests to the feasibility of similar processes proposed to occur at the surface of {100} diamond film under CVD conditions.

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Feldman KS, Campbell RF, West TR, Aloise AD, Giampetro D. Modeling chemical vapor deposition (CVD) diamond film growth with diamantane-derived radicals in solution: Permissive evidence in support of the Garrison-Brenner mechanism for incorporation of carbon into the dimer sites of the {100} diamond surface. Journal of Organic Chemistry. 1999 Oct 1;64(20):7612-7617. https://doi.org/10.1021/jo9911793

Modeling chemical vapor deposition (CVD) diamond film growth with diamantane-derived radicals in solution: Permissive evidence in support of the Garrison-Brenner mechanism for incorporation of carbon into the dimer sites of the {100} diamond surface

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