Abstract
The synthesis and partial rearrangement of nordiamantanemethyl radical into its more stable diamantyl isomer at 200-300 °C is reported. This solution phase observation attests to the feasibility of similar processes proposed to occur at the surface of {100} diamond film under CVD conditions.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 7612-7617 |
| Number of pages | 6 |
| Journal | Journal of Organic Chemistry |
| Volume | 64 |
| Issue number | 20 |
| DOIs | |
| State | Published - Oct 1 1999 |
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All Science Journal Classification (ASJC) codes
- Organic Chemistry
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Modeling chemical vapor deposition (CVD) diamond film growth with diamantane-derived radicals in solution : Permissive evidence in support of the Garrison-Brenner mechanism for incorporation of carbon into the dimer sites of the {100} diamond surface. / Feldman, Ken S.; Campbell, Robert F.; West, Theodore R.; Aloise, Allen D.; Giampetro, David.
In: Journal of Organic Chemistry, Vol. 64, No. 20, 01.10.1999, p. 7612-7617.Research output: Contribution to journal › Article
TY - JOUR
T1 - Modeling chemical vapor deposition (CVD) diamond film growth with diamantane-derived radicals in solution
T2 - Permissive evidence in support of the Garrison-Brenner mechanism for incorporation of carbon into the dimer sites of the {100} diamond surface
AU - Feldman, Ken S.
AU - Campbell, Robert F.
AU - West, Theodore R.
AU - Aloise, Allen D.
AU - Giampetro, David
PY - 1999/10/1
Y1 - 1999/10/1
N2 - The synthesis and partial rearrangement of nordiamantanemethyl radical into its more stable diamantyl isomer at 200-300 °C is reported. This solution phase observation attests to the feasibility of similar processes proposed to occur at the surface of {100} diamond film under CVD conditions.
AB - The synthesis and partial rearrangement of nordiamantanemethyl radical into its more stable diamantyl isomer at 200-300 °C is reported. This solution phase observation attests to the feasibility of similar processes proposed to occur at the surface of {100} diamond film under CVD conditions.
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U2 - 10.1021/jo9911793
DO - 10.1021/jo9911793
M3 - Article
AN - SCOPUS:0033215352
VL - 64
SP - 7612
EP - 7617
JO - Journal of Organic Chemistry
JF - Journal of Organic Chemistry
SN - 0022-3263
IS - 20
ER -