Molding of high aspect ratio ferroelectric microstructures

I. G. Mina, S. S.N. Bharadwaja, J. Raviprakash, S. Trolier-McKinstry, N. Saldanha, T. Mayer

Research output: Contribution to conferencePaperpeer-review

Abstract

Fabrication of high aspect ratio structures of complex perovskite materials using photoresist templates is reported in this work. Water based (Pb,Ba)TiO3 (PBT) and 2-methoxyethanol based PbZr 0.52Ti0.48O3 (PZT) sol-gel precursor solutions were used to infiltrate prefabricated photoresist templates on various substrates. The solutions were deposited by vacuum infiltration assisted dip coating. Pyrolysis and the crystallization of the pillars were performed after removal of the gel layer formed on the surface of the mold. During crystallization process of photoresist was removed simultaneously. Various aspect ratio PZT and PBT structures were obtained.

Original languageEnglish (US)
Pages258-261
Number of pages4
StatePublished - Dec 6 2005
Event2004 14th IEEE International Symposium on Applications of Ferroelectrics, ISAF-04. A Conference of the IEEE Ultrasonics, Feroelectrics, and Frequency Control Society (UFFC-S) - Montreal, Canada
Duration: Aug 23 2004Aug 27 2004

Other

Other2004 14th IEEE International Symposium on Applications of Ferroelectrics, ISAF-04. A Conference of the IEEE Ultrasonics, Feroelectrics, and Frequency Control Society (UFFC-S)
CountryCanada
CityMontreal
Period8/23/048/27/04

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

Fingerprint Dive into the research topics of 'Molding of high aspect ratio ferroelectric microstructures'. Together they form a unique fingerprint.

Cite this