Molecular depth profiling of trehalose using a C 60 cluster ion beam

Andreas Wucher, Juan Cheng, Nicholas Winograd

Research output: Contribution to journalArticlepeer-review

20 Scopus citations

Abstract

Molecular depth profiling of organic overlayers was performed using a mass selected fullerene ion beam in conjunction with time-of-flight (TOF-SIMS) mass spectrometry. The characteristics of depth profiles acquired on a 300-nm trehalose film on Si were studied as a function of the impact kinetic energy and charge state of the C 60 projectile ions. We find that the achieved depth resolution depends only weakly upon energy.

Original languageEnglish (US)
Pages (from-to)959-961
Number of pages3
JournalApplied Surface Science
Volume255
Issue number4
DOIs
StatePublished - Dec 15 2008

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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