Molecular depth profiling using a C60 cluster beam: The role of impact energy

Andreas Wucher, Juan Cheng, Nicholas Winograd

Research output: Contribution to journalArticlepeer-review

33 Scopus citations

Abstract

Molecular depth profiling of organic overlayers was performed using a mass-selected C60 ion beam in conjunction with time-of-flight (TOF-SIMS) mass spectrometry. The characteristics of sputter depth profiles acquired for a 300-nm Trehalose film on silicon were studied as a function of the kinetic impact energy of the projectile ions. The results are interpreted in terms of a simple model describing the balance between sputter erosion and ion-induced chemical damage. It is shown that the efficiency of the projectile to clean up the fragmentation debris produced by its own impact represents a key parameter governing the success of molecular depth profile analysis.

Original languageEnglish (US)
Pages (from-to)16550-16555
Number of pages6
JournalJournal of Physical Chemistry C
Volume112
Issue number42
DOIs
StatePublished - Oct 23 2008

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Energy(all)
  • Physical and Theoretical Chemistry
  • Surfaces, Coatings and Films

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