Molecular ruler lithography using sacrificial host structures fabricated using electron beam lithography

Shyamala Subramanian, Jeffrey M. Catchmark

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

Molecular ruler nanolithography combines conventional lithography techniques with chemical self-assembly methods to improve the resolution of the existing lithography tools. We demonstrate the implementation of molecular ruler nanolithography using sacrificial multilayer host structures defined by electron-beam lithography. Using this process, 40-nm metal features are produced using host features spaced 100 nm apart. Using a thicker sacrificial layer, 100-nm-thick daughter metal layers are also produced, demonstrating the flexibility of this technique.

Original languageEnglish (US)
Article number049701
JournalJournal of Microlithography, Microfabrication and Microsystems
Volume5
Issue number4
DOIs
StatePublished - Oct 1 2006

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Nanolithography
Electron beam lithography
Lithography
lithography
Metals
electron beams
Self assembly
Multilayers
metals
laminates
self assembly
flexibility

All Science Journal Classification (ASJC) codes

  • Atomic and Molecular Physics, and Optics
  • Electrical and Electronic Engineering

Cite this

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