Molecular ruler lithography using sacrificial host structures fabricated using electron beam lithography

Shyamala Subramanian, Jeffrey M. Catchmark

Research output: Contribution to journalArticlepeer-review

3 Scopus citations

Abstract

Molecular ruler nanolithography combines conventional lithography techniques with chemical self-assembly methods to improve the resolution of the existing lithography tools. We demonstrate the implementation of molecular ruler nanolithography using sacrificial multilayer host structures defined by electron-beam lithography. Using this process, 40-nm metal features are produced using host features spaced 100 nm apart. Using a thicker sacrificial layer, 100-nm-thick daughter metal layers are also produced, demonstrating the flexibility of this technique.

Original languageEnglish (US)
Article number049701
JournalJournal of Microlithography, Microfabrication and Microsystems
Volume5
Issue number4
DOIs
StatePublished - Oct 1 2006

All Science Journal Classification (ASJC) codes

  • Atomic and Molecular Physics, and Optics
  • Electrical and Electronic Engineering

Fingerprint Dive into the research topics of 'Molecular ruler lithography using sacrificial host structures fabricated using electron beam lithography'. Together they form a unique fingerprint.

Cite this