Molecular-ruler nanolithography

Charan Srinivasan, J. Nathan Hohman, Mary E. Anderson, Pengpeng Zhang, Paul S. Weiss, Mark W. Horn

Research output: Contribution to journalConference article

3 Scopus citations

Abstract

Molecular-ruler nanolithography uses individual molecules as building blocks to create nanometer-scale features in a low-cost, high-throughput process. Self-assembled multilayers are used in combination with radiation-sensitive polymeric resists to interface nanometer-scale features with structures fabricated using conventional lithographic methods. This technique is advantageous for its high precision, parallel processing, and low capital investment. Here, we provide an overview of molecular-ruler nanolithography and describe how this technology is being applied to the creation of nanometer-scale devices, patterning of large-area sub-200-nm grating structures, and the fabrication of quartz templates for use as molds in imprint lithography.

Original languageEnglish (US)
Article number65171I
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume6517
Issue numberPART 1
DOIs
StatePublished - Oct 15 2007
EventEmerging Lithographic Technologies XI - San Jose, CA, United States
Duration: Feb 27 2007Mar 1 2007

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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    Srinivasan, C., Hohman, J. N., Anderson, M. E., Zhang, P., Weiss, P. S., & Horn, M. W. (2007). Molecular-ruler nanolithography. Proceedings of SPIE - The International Society for Optical Engineering, 6517(PART 1), [65171I]. https://doi.org/10.1117/12.712230