Multi-layer photopolymer micromachining

J. R. Huang, B. Bai, J. Shaw, Thomas Nelson Jackson, C. Y. Wei, V. Manivannan, K. Durocher

Research output: Contribution to journalConference article

1 Citation (Scopus)

Abstract

This paper presents a novel method to create and integrate micro-machined devices and high aspect-ratio (height-to-width ratio) microstructures in which the microstructures are built up using multiple layers of photopolymer film and/or viscous solution. Very high aspect-ratio 2-and 3-dimensional (2-D and 3-D) microstructures were constructed by stacking photo-imageable polymer films. Such films may be dry films applied by lamination or solution layers applied by bar coating, or doctor blade coating. Photolithography is used in both cases to define the microstructure. This additive process of thin-film micromachining facilitates high aspect-ratio microstructure fabrication. We have demonstrated structures of up to 12-layers comprising 2-D arrays of deep trenches (180 μm deep and 25 μm wide) and a 2-layer SU-8 micro-trench array with an aspect ratio up to 36 on glass substrates. Miniaturized structures of interconnected reservoirs as small as 50 μm × 50 μm × 15 μm (∼38 pico liter storage capacity) are also being fabricated, along with a novel 5-layer microfluidic channel array and a vacuum-infiltration process for fluid manipulation. This method has the potential to create functional large-area micro-devices at low-cost and with increased device flexibility, durability, prototyping speed, and reduced process complexity for applications in optoelectronics, integrated detectors, and biodevices. The novel multi-layer photopolymer dry film and solution process also allows microstructures in micro-electro-mechanical systems (MEMS) to be built with ease and provides the functionality of MEMS integration with electronic devices and integrated circuits (ICs).

Original languageEnglish (US)
Article numberJ11.5
Pages (from-to)175-188
Number of pages14
JournalMaterials Research Society Symposium Proceedings
Volume872
StatePublished - Dec 1 2005
Event2005 Materials Research Society Spring Meeting - San Francisco, CA, United States
Duration: Mar 28 2005Apr 1 2005

Fingerprint

Photopolymers
photopolymers
Micromachining
micromachining
microstructure
Microstructure
Aspect ratio
high aspect ratio
Integrated optoelectronics
coatings
Coatings
systems integration
Photolithography
infiltration
photolithography
blades
durability
Infiltration
Polymer films
Microfluidics

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

Huang, J. R., Bai, B., Shaw, J., Jackson, T. N., Wei, C. Y., Manivannan, V., & Durocher, K. (2005). Multi-layer photopolymer micromachining. Materials Research Society Symposium Proceedings, 872, 175-188. [J11.5].
Huang, J. R. ; Bai, B. ; Shaw, J. ; Jackson, Thomas Nelson ; Wei, C. Y. ; Manivannan, V. ; Durocher, K. / Multi-layer photopolymer micromachining. In: Materials Research Society Symposium Proceedings. 2005 ; Vol. 872. pp. 175-188.
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Huang, JR, Bai, B, Shaw, J, Jackson, TN, Wei, CY, Manivannan, V & Durocher, K 2005, 'Multi-layer photopolymer micromachining', Materials Research Society Symposium Proceedings, vol. 872, J11.5, pp. 175-188.

Multi-layer photopolymer micromachining. / Huang, J. R.; Bai, B.; Shaw, J.; Jackson, Thomas Nelson; Wei, C. Y.; Manivannan, V.; Durocher, K.

In: Materials Research Society Symposium Proceedings, Vol. 872, J11.5, 01.12.2005, p. 175-188.

Research output: Contribution to journalConference article

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T1 - Multi-layer photopolymer micromachining

AU - Huang, J. R.

AU - Bai, B.

AU - Shaw, J.

AU - Jackson, Thomas Nelson

AU - Wei, C. Y.

AU - Manivannan, V.

AU - Durocher, K.

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N2 - This paper presents a novel method to create and integrate micro-machined devices and high aspect-ratio (height-to-width ratio) microstructures in which the microstructures are built up using multiple layers of photopolymer film and/or viscous solution. Very high aspect-ratio 2-and 3-dimensional (2-D and 3-D) microstructures were constructed by stacking photo-imageable polymer films. Such films may be dry films applied by lamination or solution layers applied by bar coating, or doctor blade coating. Photolithography is used in both cases to define the microstructure. This additive process of thin-film micromachining facilitates high aspect-ratio microstructure fabrication. We have demonstrated structures of up to 12-layers comprising 2-D arrays of deep trenches (180 μm deep and 25 μm wide) and a 2-layer SU-8 micro-trench array with an aspect ratio up to 36 on glass substrates. Miniaturized structures of interconnected reservoirs as small as 50 μm × 50 μm × 15 μm (∼38 pico liter storage capacity) are also being fabricated, along with a novel 5-layer microfluidic channel array and a vacuum-infiltration process for fluid manipulation. This method has the potential to create functional large-area micro-devices at low-cost and with increased device flexibility, durability, prototyping speed, and reduced process complexity for applications in optoelectronics, integrated detectors, and biodevices. The novel multi-layer photopolymer dry film and solution process also allows microstructures in micro-electro-mechanical systems (MEMS) to be built with ease and provides the functionality of MEMS integration with electronic devices and integrated circuits (ICs).

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Huang JR, Bai B, Shaw J, Jackson TN, Wei CY, Manivannan V et al. Multi-layer photopolymer micromachining. Materials Research Society Symposium Proceedings. 2005 Dec 1;872:175-188. J11.5.