Nano-size silicon whiskers produced by chemical vapor deposition

Lu Shen, Youming Xiao, Ying Ma, Francis S. Galasso, Steven L. Suib, James D. Freihaut

Research output: Contribution to journalConference articlepeer-review

Abstract

Sponge type deposits composed of nanometer sized Si whiskers were formed on Davisil (porous SiO2) gel substrates by chemical vapor deposition (CVD) using methyltrichlorosilane (MTS) as a precursor and H2 as carrier gas. The diameters of the fine whiskers are estimated to be 100 nm or smaller from SEM observations. XRD analyses revealed that the coatings formed at 800 and 900°C contained microcrystalline Si and the Auger analysis indicated the existence of free carbon. The surface area of the coated Davisil was approximately 189 ± 5 m2/g, as obtained from BET measurements. The coatings were also applied on several other substrates, such as AlN and low surface area (< 224 m2/g) silica gel, with the same coating conditions. On these substrates, highly porous Si has also been observed on AlN substrates, and nonporous, half sphere shaped coatings were observed on low surface area silica gel substrates.

Original languageEnglish (US)
Pages (from-to)147-156
Number of pages10
JournalMaterials Research Society Symposium - Proceedings
Volume351
DOIs
StatePublished - 1994
EventProceedings of the 1994 MRS Symposium - San Francisco, CA, USA
Duration: Apr 4 1994Apr 8 1994

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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