Nanostructures using self-assembled multilayers as molecular rulers and etch resists

C. Srinivasan, J. N. Hohman, M. E. Anderson, P. S. Weiss, M. W. Horn

Research output: Contribution to journalArticlepeer-review

5 Scopus citations

Abstract

Self-assembled multilayers, composed of alternating layers of α,ω -mercaptoalkanoic acids and Cu2+ ions ("molecular rulers"), are used as organic sidewall spacers and etch resists for the fabrication of registered microstructures with precisely tailored nanometer-scale spacings. The method outlined here eases the stringency of the lithographic processing for patterning second-generation features. Additionally, a new method to lift off the self-assembled multilayered films for the generation of the tailored nanogaps is demonstrated. The advantages of these techniques are discussed.

Original languageEnglish (US)
Pages (from-to)1985-1988
Number of pages4
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume25
Issue number6
DOIs
StatePublished - 2007

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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