New lithographic techniques for X-ray spectroscopy

Jake McCoy, Randall McEntaffer, Casey DeRoo

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Scopus citations

Abstract

Off-plane reflection gratings require high-fidelity, custom groove profiles to perform with high spectral resolution in a Wolter-I optical system. This places a premium on exploring lithographic techniques in nanofabrication to produce state-of-the-art gratings. The fabrication recipe currently being pursued involves electron-beam lithography (EBL) and reactive ion etching (RIE) to define the groove profile, wet anisotropic etching in silicon to achieve blazed grooves and UV-nanoimprint lithography (UV-NIL) to replicate the final product. A process involving grayscale EBL and thermal reflow known as thermally activated selective topography equilibration (TASTE) is also being investigated as an alternative method to fabricate these gratings. However, a master grating fabricated entirely in soft polymeric resist through the TASTE process requires imprinting procedures other than UV-NIL to explored. A commerically available process called substrate conformal imprint lithography (SCIL) has been identified as a possible solution to this problem. SCIL also has the ability to replicate etched silicon gratings with reduced trapped air defects as compared to UV-NIL, where it is difficult to achieve conformal contact over large areas. As a result, SCIL has the potential to replace UV-NIL in the current grating fabrication recipe.

Original languageEnglish (US)
Title of host publicationSpace Telescopes and Instrumentation 2016
Subtitle of host publicationUltraviolet to Gamma Ray
EditorsMarshall Bautz, Tadayuki Takahashi, Jan-Willem A. den Herder
PublisherSPIE
ISBN (Electronic)9781510601895
DOIs
StatePublished - Jan 1 2016
EventSpace Telescopes and Instrumentation 2016: Ultraviolet to Gamma Ray - Edinburgh, United Kingdom
Duration: Jun 26 2016Jul 1 2016

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume9905
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Other

OtherSpace Telescopes and Instrumentation 2016: Ultraviolet to Gamma Ray
CountryUnited Kingdom
CityEdinburgh
Period6/26/167/1/16

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Fingerprint Dive into the research topics of 'New lithographic techniques for X-ray spectroscopy'. Together they form a unique fingerprint.

  • Cite this

    McCoy, J., McEntaffer, R., & DeRoo, C. (2016). New lithographic techniques for X-ray spectroscopy. In M. Bautz, T. Takahashi, & J-W. A. den Herder (Eds.), Space Telescopes and Instrumentation 2016: Ultraviolet to Gamma Ray [990524] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 9905). SPIE. https://doi.org/10.1117/12.2232072