New Si CVD precursors: preparation and pre-screening

D. Gaines, M. Hop, T. Kuech, J. Redwing, D. Saulys, A. Thon

Research output: Contribution to journalConference articlepeer-review

Abstract

The use of silanes and their organo-derivatives as precursors and dopants in chemical vapor deposition (CVD) to prepare (modified) thin films with unique surface properties is becoming popular. However, as film growth is capital intensive and mechanistically complex, while film characterization is time-consuming and often requires sophisticated instrumentation, a technique requiring a minimum of time and sample to provide information directly related to aspects of the film growth processes is needed. This article reports a study being conducted to determine the suitability of mass spectroscopy as a precursor screening tool.

Original languageEnglish (US)
Pages (from-to)81-86
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Volume377
DOIs
StatePublished - 1995
EventProceedings of the 1995 MRS Spring Meeting - San Francisco, CA, USA
Duration: Apr 17 1995Apr 21 1995

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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